K575X Turbo Sputter Coater
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The K575X is a compact turbomolecular pumped sputter coater optimised to deposit fine grain chromium and other metals for SEM, FEG-SEM and thin film applications. The sputter coating process is completely automatic making the K575X ideal for inexperienced users.
 Cooled magnetron sputtering headAt the heart of the K575X is a highly efficient cooled magnetron sputtering head, designed to deposit a range of oxidising and non-oxidising metals. A chromium target is fitted as standard, but the "quick change" design allows a wide range of target materials to be used. The highly efficient Peltier cooled sputtering head does not require water cooling. |
Rapid pumping
The K575X uses a robust 90 l/s turbomolecular pump, "backed" by 50 l/m rotary pump (rotary pump needs to be order separately) with the complete pumping sequence being under automatic control. The vacuum chamber is 156mm (6") in diameter and incorporates a 60mm diameter rotating stage with adjustable tilt facility.
The process vacuum can be adjusted to suit conditions for chromium and other oxidising metals, as well as gold targets and other non-oxidising metals.
Fully automatic control
Microprocessor control with automatic operation allows the operator to preset optimum process conditions. A gas bleed needle valve is fitted with electromagnetic valve back up.
Comprehensive options
Add-on accessories include carbon rod and carbon fibre attachments and a Film Thickness Monitor (FTM) package. See below for details.
A tilt and rotate stage is included as standard.
Key features
- Full automatic control
- Ultra-high resolution chromium sputtering (less than 0.5nm chromium grain size)
- Thin film deposition (typically 5nm) even thickness
- Turbo molecular pumping
- Modular control electronics
- Clean line design
- L.C.D. status/data entry (vacuum, time & current)
- Active vacuum gauge head (giving full vacuum operating range)
- Peltier cooled target - no water requirements
Sputtering targets
Other targets include:
The K575X is fitted as standard with a 0.2mm thick chromium sputtering target. Other targets include:
| Gold | ||
| Gold / Palladium (80/20) | Titanium | Tantalum |
| Palladium | Iridium | Titanium |
| Platinium | Aluminium | Chromium (1.5mm thick) |
| Platinium / Palladium (80/20) | Tungsten | |
| Copper | Colbalt | |
| Nickel | Molybdenum | |
| Silver | Magnesium |
For full list please see ordering information
| Specifications of the K575X | |
|---|---|
| Instrument case | - 450mm W x 350mm diameter x 175mm H |
| Plus base collar | - 110mm diameter x 115mm H |
| Weight | - 42Kg |
| Work chamber | - borosilicate glass 165mm diameter x 125mm H |
| Safety shield | - polycarbonate |
| Target | - 54mm diameter x 0.2mm thick, chromium fitted as standard |
| Specimen stage | - 60mm diameter rotation stage with tilt facility |
| Vacuum gauge range | - atmosphere to 1 x 10-5mbar |
| Operating vacuum | - 1 x 10-3mbar to 1 x 10-4mbar |
| Deposition current | - 0-50mA |
| Deposition rate | - 0-20nm/minute |
| Sputter timer | - 0-4 minutes |
| Turbomolecular pump | - 60 litres/second (ultimate vacuum 1 x10-8mbar) |
| Services | - argon - nominal 10 psi - nitrogen- nominal 10 psi (argon may be used as common gas) |
| Vacuum pump | - 50 l/m two-stage rotary pump with oil mist filter (E5005F) |
| Electrical supply | - 230 Volts 50Hz (6 Amp max. including pump) - 115 Volts 60Hz (12 Amp max. including pump) |
| Warranty | - two-years all parts |
| Conformity | - CE conformity |
Options and accessories
The K250X carbon evaporation attachment
Sputtering images
K575X turbo sputter coater - sputting of Iridium and other materials
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