Back to Products      Back to PT7160

PT7160 RF Plasma Barrel Reactor Site Requirements

Mains electricity supply

A suitable mains electricity supply (110 Vac - 20amps or 240 Vac - 13amps,
frequency 50/60 Hz) is available. Check that the voltage label attached to the side of the cabinet is suitable for the local voltage and frequency.
The units are supplied for either 230V or 110V operation at 50/60Hz.

Position

The PT7160 should be positioned in the laboratory convenient for the process gas supply/or cylinders and has safe venting of toxic process gases.
There needs to be adequate access to the rear of the unit for gas and vent connections.

Vacuum pump

Ensure the rotary pump is filled with oil in accordance with the manufacturers
instructions. The exhaust should be filtered or expelled to a safe area. All pumps supplied by Quorum Technologies are fitted with an exhaust filter.

Rotary pumps and process gases

When using RF plasma equipment, certain precautions are necessary with regard to rotary pumps and exhaust gases.
Precautions must be taken in the removal of exhaust gases
from the pump as they may contain free halogens

1. If the etching gas is oxygen, it is essential that Fomblin oil, a non-hydrocarbon oil, is used, therefore a Fomblinised pump should be used with the unit.
2. With etching gases that contain fluorine or chlorine, precautions must be taken in the removal of exhaust gases from the pump as they may contain free halogens.
3. Some etching gases, such as sulphur hexafluoride require special rotary pump oils. If in doubt, contact the Quorum Technologies, or the manufacturers of the rotary pump.

Space requirement

520mm wide x 520mm deep x 300 mm. Weight: 60Kg. Addition space is required for the rotary pump, which can be located either on the floor or on the bench with the PT7160.