SC7680 High Resolution Large Chamber Sputter Coater
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The SC7680 has all the benefits of the renowned
SC7640, but with the added ability to handle samples up to 200
mm (8”) in diameter. A variable speed rotational spin table (RS7609) is included as standard. The rotational sample spin table is designed to accommodate large samples. Special extendable clips allow adjustment to securely hold 4”, 6” or 8” wafers. For coating 4” and 6” diameter samples the spin table can be set for eccentric rotation, for 8” samples the spin table can easily be adjusted for concentric rotation. In addition to the spin table, the SC7680 comes with a small universal sample stage for regular SEM sample stubs, similar to that fitted to the SC7640 sputter coater. Operation is switchable between automatic and manual. Automatic operation saves operator time and allows inexperienced users to prepare samples. A unique "cool" sputtering head with annular target means that fine grain coatings are routinely achieved. The SC7680 is offered with a free-of-charge 3 year warranty. |
Key Features
- Fine grain "cool" high resolution sputtering
- 250 mm (10” ) OD glass chamber
- Stage to hold and rotate 4”, 6” and 8” wafers
- Concentric and eccentric (epicyclical) sample rotation
- Normal universal sample stage (for SEM pin stubs)
- Moveable two-position sputtering head
- Advanced magnetron style sputtering head with annular target
- Automatic or manual operation
- Positive-break mechanical interlock (to ensure the sputtering head is electrically isolated when the optional carbon evaporation head is used)
- Solenoid leak, vent and flush valves
- 3-year warranty
Options
- RC7606 “rota cota” sample stage
- WS7608 water cooled stage
- FT7608 FTM stage (requires FTM7690 FTM module)
- CA0768R carbon rod evaporation head and CA7625 carbon power supply package
- FT7687 FTM crystal holder and feedthrough for use with 6” and
8” samples (e.g. wafers) is mounted peripherally and adjustable
for position (requires FTM7690 FTM module)
A routine cycle time for coating SEM samples with a typical
conductive coating (5 – 10) nm of gold or gold / palladium will
be less than four minutes.
Options include carbon rod and carbon fibre evaporation heads, Film Thickness
Monitor (centrally located – FT7607 or the variable position FT7687) a
rotary planetary stage (RC7606) and a water cooled stage (WS7608).
The SC7680 is supplied with a gold/palladium target, with others (gold, platinum,
nickel, silver, palladium) available as options. The SC7680 is a complete working
system and comes with vacuum and electrical fittings, and a comprehensive 36
page manual. A suitable 90 litre per minute rotary pump is required (see E50005G).
For faster pumping a 160 litre per minute rotary pump can be used (E5005H).
Sample stage - RS7609 epicyclic rotary spin table
(standard)
This will be of particular interest for users of semiconductor wafers samples.
The RS7609 can be configured for concentric rotation, suitable for up to 8” (200mm)
diameter samples, or as an offset dual rotation (epicyclical) for up to 6” (150mm)
diameter samples.
A smaller SEM stub holder (supplied) can be mounted centrally on the spin table
platform for holding routine SEM pin stubs.
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RS7609 rotation stage + optional FTM (right hand side) |
RS7609 viewed from top |
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Eccentric rotation |
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Sputtering Head
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Centrally mounted sputtering head |
Off-set for even coverage of 8 inch samples |
| The SC7680 is an extremely versatile sputter coater designed to produce fine grain "cool" coatings. At its heart the SC7680 has an advanced annular style magnetron head which is designed to ensure even coating over a wide area. This enables thin coatings of 2-3 nm to be achieved without charging effects being experienced in the SEM. The sputter head when operated at 800V DC gives high resolution coatings. Alternatively standard coatings with rapid deposition can be achieved at higher voltages. Coating time is controlled with a 999 second timer. Pressure levels and plasma currents are monitored by analogue meters. |
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Close up of sputtering head with annular target |
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| The SC7680 can be used in two modes: automatic for standard coatings, or manual operation with complete control of all parameters - essential for the production of high resolution films. When the SC7680 is operated in manual mode, pump down, purge and flush are still carried out automatically, this maintains system versatility but releases the user from time consuming mundane operations. For Field Emission SEM and high resolution SEM the platinum target (SC510-314C) is recommended. | |
Requirements
| A 90 l/m two-stage rotary pump with oil mist filter
is recommended (see E5005G). For fast pumping 160 l/m two-stage rotary
pump can be used. If an existing rotary pump is to be used it is
important that its capacity is 90 l/m or greater. |
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Options and Accessories
Carbon Coating
A versatile carbon coating accessory consisting of CA7625 power supply and CA078R rod source is available. We can offer a carbon rod head in THREE formats, with one, two or three carbon rod guns. If the user wishes to evaporate carbon over a large area we recommend two or three sources, for evaporation on to smaller areas (e.g. the small six stub sample holder) one source is recommended. |
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| CA078R/1 Carbon rod head with one adjustable position carbon rod gun, carbon evaporation power supply (includes packet of 10 A0832A shaped 6.2mm carbon rods) |
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| CA078R/2 Carbon rod head with two adjustable position carbon rod guns, carbon evaporation power supply (includes packet of 10 A0832A shaped 6.2mm carbon rods) |
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| CA078R/3 Carbon rod head with three adjustable position carbon rod guns, carbon evaporation power supply (includes packet of 10 A0832A shaped 6.2mm carbon rods) |
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| Fitting the optional CA7625 and carbon
evaporation head (CA078R) is simple. The hinged sputtering head is tilted
back and replaced with the CA078R. Connection is then made to the CA7625 power
supply. Please note that in order to ensure that the exposed sputtering head cannot be powered when the add-on carbon head is under vacuum, a positive break electro-mechanical interlock ensures electrically isolation of the sputtering head. The SC7605 carbon rod grinder is also available for custom shaping of carbon rods. Note: we also offer a "stand alone" SEM carbon coater – the CC7650 |
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CA7625 Carbon evaporation power supply |
Choosing a target
Gold/palladium: supplied as standard. Has the same
properties (sputtering rate, secondary electron yield, cost) as gold
but grain size is smaller.
Gold: the traditional choice.
Platinum: for high resolution coating. The sputtered grain
size is smaller than gold or Gold / palladium. Slower sputtering rate,
more expensive than gold or gold/palladium.
Silver: compared to the other metals, it is relatively
easy to remove silver. Therefore, useful for museum and forensic samples.
Palladium: sometimes used instead of gold, gold/palladium
and platinum for x-ray microanalysis.
Stage Options
The SC7680 is fitted as standard with the RS7609 epicyclic rotary
spin table (see above). Plus smaller SEM stub holder which can be mounted
centrally on the spin table platform for holding routine SEM pin stubs.
Optional stages
There are four other interchangeable stage options (please note
only one stage can be fitted at any time):
FT7607 Film thickness monitor stage (centrally located)
FT7687 Adjustable position film thickness crystal holder with separate feedthough.
RC7606 Rota cota stage
WS7608 Water cooled stage
Film thickness monitor (FTM) and FT7607 FTM stage
Enables the deposition thickness to be selected and controlled
with a resolution of 0.1 nm. The FT7690 module and FT7607 Film Thickness
Monitor stage (centrally located) and / or FT7687 adjustable position
film thickness crystal holder are required. See the FT7690
Film Thickness Monitor for details.
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| RC7606 Rota cota stage Sputtering is essentially an omni-directional technique and will give conductive coatings to most SEM samples. However, some small spherical samples (e.g. latex spheres, embryos etc.,) do sometimes require rotation in order to give a complete and continuous coating at the point where the sphere makes contact with the sample stub. The RC7606 rota cota replaces the existing universal stage and allows the operator to tilt and rotate samples with respect to the sputtering head. Carbon evaporation, using the optional carbon attachment, is essentially a "line of sight" (unidirectional) technique. So for samples with complicated surfaces, the RC7606 option is useful for ensuring even deposition of carbon. |
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WS7608 Water cooled stage
An optional water cooled sample stage can replace the standard universal stage.
Because the SC7640 has a very efficient "cool" sputtering head, energy
(heat) reaching the samples is negligible and sample cooling unnecessary.
The WS7608 stage is sometimes useful for samples that have melting points at
around ambient temperature (e.g. some waxes).
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