Built to withstand heavy use - 24 hours a day for some plasma ashing schedules - the K1050X features microprocessor control with automatic operation and offers durability and simplicity of operation. Barrel systems plasma etch or plasma ash isotropically (in all directions) and are suitable for the majority of applications.

The K1050X uses a low pressure, RF-induced gaseous discharge to modify specimen surfaces or remove specimen material in a gentle, controlled way. A significant advantage over alternative methods is that the plasma etching and ashing processes are dry (no wet chemicals needed) and take place at relatively low temperatures.

A wide range of surface modification methods are available, using a variety of process gases. Using oxygen (or air) as the process gas, the molecules disassociate into chemically-active atoms and molecules and the resulting ‘combustion’ products are conveniently carried away in the gas stream by the vacuum system.

Chamber, specimen handling and gas control

The K1050X has a 110mm diameter x 160mm borosilicate glass chamber horizontally mounted with a slide-out specimen drawer and viewing window. Evacuation of the chamber is achieved by an optional 50L/m mechanical rotary vacuum pump. Ingress of reactive gases is controlled by two built-in flow-meters backed by solenoid valves.

NB: For applications where borosilicate glass needs to be avoided, the K1050X can be fitted with a quartz chamber (EK4222).

Power, tuning and vacuum monitoring

RF power of up to 100W at 13.56MHz is available and can be infinitely controlled and pre-set to required values. Automatic tuning of forward and reflected power is standard. Forward power and vacuum levels are indicated by the digital display.

Automated microprocessor control

The K1050X is fully automatic. Control parameters for time, power and vacuum are easy to preset and can be monitored and adjusted throughout the process run.

‘Autotuning’ of RF power for optimum control and reproducibility

During the plasma process the ‘autotune’ facility ensures that the RF power is automatically impedance-matched to any variation in the system or loading. This means conditions in the chamber are maintained at their optimum - important as it gives faster reaction times, greater reproducibility of results and protects the power supply during the RF cycle.

Pumping options

A working system requires only the addition of a specified rotary pump. A fomblinised rotary pump (EK3176) is strongly recommended for safety reasons when applications involve the use of oxygen as a process gas. Where oil-based rotary pumps need to be avoided, we offer dry pumping options (see Specifications).