Product Description
Coating sources
The K975X is fitted with a carbon rod gun and metal filament/boat source which can also be used for cleaning TEM and SEM apertures. An optional sputtering source is available.Work chamber
The borosilicate glass work chamber is 250mm diameter x 300mm and mounted on an aluminium support collar. A tough chamber implosion guard is included as standard. The chamber can accommodate specimens up to 8"/200mm in diameter. A unique rack-out specimen loading system gives the user easy specimen access and the hinged lid assembly makes other areas of the vacuum chamber readily accessible.Menu-driven control
The menu-driven microcontroller allows the user access to a range of options, but readily ‘defaults’ to optimum operating conditions, allowing both fully-automatic and manual override as required.Turbomolecular pumping and venting
The K975X uses a modern 100L/s turbomolecular pump backed up by an external rotary vacuum pump (not included, see EK3175) with the complete pumping sequence being under fully-automatic control.The vacuum pump-down sequence is automatically controlled by the system microprocessor. Vacuum measurement is by a combined pirani/penning gauge and is displayed digitally.
Process gases (nitrogen for venting - if fitted - and argon for the optional EK4175 sputtering attachment) are automatically controlled and can be programmed for use during coating sequences. The vent valve has an adjustable restrictor and programmable vent time to prevent disturbing specimens due to the inrush of gas at the end of the cycle.
Specimen stages
The K975X is fitted with an 80mm flat stage as standard, but this may be exchanged for optional holders, such as a 3mm grid holder, low-angle shadowing attachment and a rotary planetary stage (see Options and Accessories). Specimen holders are supplied with a bayonet fixing for quick removal.The rotary stage is mounted on a sliding access port on the side of the chamber. This allows the user to exchange specimens quickly without having to remove the glass chamber and disturb any coating set-up. The standard flat stage may be tilted for rotary shadowing techniques from 0° to +/- 180°.
Chamber base plate and evaporation power supplies
The K975X is fitted with a 0-100A evaporation power supply with base plate terminals for carbon rod evaporation (14V/100A), evaporation from a metal filament (15V/35A), carbon string evaporation (25V/35A) and a terminal rated at 5V/35A for TEM and SEM aperture cleaning using a molybdenum (Mo) boat. A wide range of add-on options is available - see Options and Accessories.K975S Thermal Evaporator
The K975S is based on the K975X, but a special load lock door allows the loading of wafers up to 8"/200mm. Please contact us for more information.Additional Information
| Options and Accessories | * K975S Loading stage for up to 8"/200mm wafers * Film Thickness Monitor (11520) attachment with controller mounted in the K975X consol. Includes monitor and stage complete with quartz crystal holder and quartz crystal * EK4117 Metal evaporation source for filament/boat evaporation and aperture cleaning * EK4175 Sputtering module (for oxidising and non-oxidising metals, see Q150T for available targets) * EK4205 Rotating specimen stage (planetary style) with externally adjustable tilt angle * EK4160 Low-angle shadowing. Ideal for flat TEM specimens, such as DNA proteins and virus particles * SC7605 Motorised carbon rod grinder for reproducible ‘stepped’ profile rods (manual shaper supplied with instrument) |
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Specifications |
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
| Ordering Information |
|
||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||