Ideal for SEM, high resolution FE-SEM and TEM applicationsThe Q150T is available in three formats: sputtering, carbon evaporation or both. Depending upon the selected configuration, the Q150T can be a top-of-the-range sputter coater for high resolution scanning electron microscopy (SEM), a carbon coater suitable for SEM and transmission electron microscopy (TEM), or both - in a single easy-to-use system.
The ability of the Q150T to rapidly sputter a wide selection of oxidising and non-oxidising metals also makes it an ideal platform for many thin film applications.
Moulded case with colour touch screenThe Q150T is presented in a custom moulded, one-piece case - allowing easy servicing access. The colour touch screen allows multiple users to input and store coating ‘recipes’.
The case houses all the working components, including the efficient 70L/s air-cooled turbomolecular pump. Automatic bleed control ensures optimum vacuum conditions during sputtering.
The vacuum chamber has an internal diameter of 165mm/6” and comes with an integral implosion guard. The Q150T also includes ‘vacuum shutdown’, which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.
A variable speed rotary specimen stage is fitted as standard, with other stages available as options - see Options and Accessories.
Sputter coating, carbon coating or bothThe three different formats of the Q150T each include a range of optional accessories:
*Q150T S - a high resolution sputter coater for oxidising and non-oxidising (noble) metals. A wide selection of sputtering targets is available, including iridium (Ir) and chromium (Cr) which are highly recommended for FE-SEM applications.
*Q150T E - a high vacuum carbon coater, ideal for the production of highly stable carbon films and surface replicas for transmission electron microscopy (TEM). The system uses economical, high purity 3.05mm Ø carbon rods.
*Q150T ES - a combined system with both sputtering and carbon coating. The deposition heads can be swapped in seconds and the intelligent system logic automatically recognises which head is in place and displays the appropriate operating settings.
Each of the above can be fitted with a range of optional accessories (metal evaporation, carbon fibre coating, film thickness monitor, etc). See Options and Accessories for details.
Rapid data entryAt the operational heart of the Q150T is a simple colour touch screen which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. To further aid ease of use, a number of typical sputtering and evaporation profiles are already stored.
Carbon coating - pulsed or ramped evaporation mode (Q150T ES and Q150T E)Pulsed evaporation is suitable for most SEM carbon coating processes and for applications requiring enhanced control and reproducibly of thickness of deposition, for example for TEM carbon films.
Generally, this process requires the use of the optional extended-height chamber (see 10429). However, the shorter standard chamber may be used for coating thicknesses greater than 12nm. Additionally, if the short chamber is used, the FTM measurement may be inaccurate due to the close proximity of the high temperature carbon rods.
Pulsed cleaning for aluminium sputteringAluminium (Al) can be difficult to coat due to its fast oxidising properties. Also, its oxidised layer is difficult to remove because it reduces the required target voltage to produce a sputter current of 150mA. This increases the time required to clean the target.
However, the Q150T ES and Q150T S have special profiles for aluminium (Al) that reduce the oxide removal time and prevent excessive pre-sputtering of the already clean target.
|Glow Discharge Attachment||The primary application of glow discharge is as a technique for the surface modification, or ‘wetting’, of newly-evaporated transmission electron microscopy (TEM) carbon support films.
HydrophilisationFreshly-made TEM carbon support films tend to have hydrophobic surfaces which inhibits the spreading of suspensions of particles in negative staining solutions. However, after glow discharge treatment with air, the carbon film is made hydrophilic and negatively charged, thus allowing easy spreading of aqueous suspensions. With subsequent magnesium acetate treatment the surface is made hydrophilic and positively charged.
In addition to glow discharge treatment using air, other process gases may be used to modify surface properties. For example, methanol as a process gas results in the surface becoming hydrophobic and negatively charged. Such treatment can facilitate the optional absorption of selected biomolecules.
|Options and Accessories (including details of coating head inserts and specimen stages that are fitted as standard)||
Coating head options:A range of interchangeable, plug-in style coating head inserts are available:
* Sputtering head insert. Suitable for oxidising and non-oxidising metals. Supplied with a 54mm Ø x 0.3mm thick chromium (Cr) target as standard. For additional targets see Ordering Information
* Additional sputter head insert. Available for quick coating material change (TS and TES versions only)
* Carbon rod evaporation head insert (for 3.05mm Ø rods)
* Carbon rod evaporation head insert (for 6.15mm Ø rods). NB: we recommend 3.05mm Ø rods as they offer greater process control and are more economical (less wastage)
* Carbon fibre evaporation head insert
* Metal evaporation and aperture cleaning head insert, including the ability to evaporate upwards or downwards (TE and TES versions only)
Specimen stages:The Q150T has specimen stages to meet most requirements. All are easy-to-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage):
* Rotation stage, 50mm Ø (supplied as standard). This stage only rotates - no tilt or height adjustment
* Rotate-tilt stage, 50mm Ø with height adjustment (target to stage height variable between 37mm and 60mm). The tilt angle can be pre-set
* Variable angle ‘Rota-cota’ rotary planetary stage with 50mm Ø specimen platform
* Flat rotation stage for 4"/100mm wafers
* Rotation stage for glass microscope slides
Other options:* Extended height chamber for tall specimens
* Film Thickness Monitor (FTM). The optional 10454 consists of a controller and quartz crystal oscillator built into the Q150T, and a vacuum feed through, chamber-mounted crystal holder and quartz crystal. As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. This ‘modification’ is used to measure and control the thickness of material deposited
* Full range vacuum gauge for low and high vacuum measurement (a low vacuum Pirani gauge is fitted as standard)