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Q300T D Dual Target Sequential Sputtering System

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  • Q300T D Dual Target Sequential Sputtering System
  • Q300T D Dual Target Sequential Sputtering System
  • Dual sputtering heads for sequentially sputtering two metals without breaking vacuum
  • Dual sputtering heads and automatic shutter
  • Standard rotating specimen stage - for 4” wafers or individual SEM mounting stubs. Shown with optional dual-channel film thickness monitor (10779)
  • Standard rotating specimen stage with 4” wafer and optional dual-channel film thickness monitor (10779)
  • Rotary planetary stage (10360) and dual-channel film thickness monitor (10779) - both Q300T D options
  • Optional specimen stage for glass microscope slides (10358) and dual-channel film thickness monitor (10779) option
  • Fully automatic touch screen control
  • 11223 lockable emergency stop (e-stop) switch option. NB: Does not inhibit or replace the normal on/off switch function

Q300T D Dual Target Sequential Sputtering System

Quick Overview

The Q300T D is a fully automatic, free-standing sputter coater ideally suited for thin film applications and for conductive coating of scanning electron microscopy (SEM) specimens.

At the operational heart of the Q300T D is a large chamber fitted with two independent sputtering heads. This dual-head configuration allows two different metals to be sequentially sputtered without the need to 'break' vacuum. A dual channel film thickness monitor option is available.

The system is designed to sputter a wide range of oxidising metals, eg chromium (Cr) and aluminium (Al), and non-oxidising (noble) metals, eg gold (Au) and platinum (Pt).

The Q300T D sputter coater has a 300mm x 127mm work chamber and a specimen stage that accepts substrates of 2-4" wafer sizes as standard and 6" wafers with an optional stage accessory. An optional extended height glass chamber is available to enable coating of larger specimens.

Key Features

  • * Fully automatic touch screen control - rapid data input, simple operation
  • * Customer-defined coating protocols
  • * Dual sputter head - for sequential sputtering of two different metals, ideal for many thin film applications
  • * A wide range of oxidising and non-oxidising targets are available
  • * Fine grain sputtering - for advanced high resolution FE-SEM applications
  • * Large chamber format
  • * Coat logging - details of the last 100 coatings available on screen
  • * Optional dual channel film thickness monitor (FTM) module
  • * High-vacuum turbo pumping - NB: To avoid a short target life, it is not advisable to use targets of less than 0.3mm for coatings of 50nm or thicker in conjunction with high sputter currents. Please consider using a bonded or thicker target
  • * Automatic vacuum control - can be pre-programmed to suit the process and material, no needle valve to adjust
  • * Vacuum shut-down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance
  • * Pump hold - allows the system to be held in continuous pumping mode, awaiting user input before continuing the process
  • * Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum
  • * Ergonomic one-piece moulded case - easy maintenance and service access
  • * Ethernet with local FTP server connection - simple programmer updates
  • * Power factor correction - complies with the current legislation (CE Certification) - efficient use of power means reduced running costs
  • * Three-year warranty
For information on the Q300T D and the sputter coating technique, visit our Preparation Techniques and Advantages page.

To view sputter coating and other applications images, visit our Image Gallery.

To search and buy accessories for this product, visit our Shop. Purchases restricted to UK customers only.

Product Description

Ideal for sputter coating large specimens, thin film applications and SEM/FE-SEM
The Q300T D is suitable for sputtering a range of oxidising and non-oxidising (noble) metals for scanning electron microscopy (SEM) and thin film applications. The range of target materials available is extensive - see Ordering Information. The
Q300T D comes as standard with a chromium (Cr) target and gold (Au) target.

High-vacuum turbomolecular pumping
The Q300T D is fitted with an internally mounted 70L/s turbomolecular pump, backed by a 50L/m two-stage rotary pump (order separately). A Pirani vacuum measurement gauge (range: 1,000mbar to 5x10-4mbar) is included, but a full range gauge (1,000mbar to 5x10-9mbar) is available as an option. Typical ultimate vacuum of around 5x10-5mbar can be expected in a clean system after pre-pumping with dry nitrogen gas.

Dual head sputtering - for sequential sputtering
The Q300T D is fitted with two independent sputtering heads to allow sequential sputtering of two different metals without the need to ‘break’ vacuum, for example, a thin ‘seeding’ layer of chromium (Cr) followed by deposition of gold (Au). An automatic shutter mechanism is fitted to enable cleaning of oxidising sputter targets and to protect the second target and substrate during coatings. For single metal applications, one target can be selected.

Specimen stages
The Q300T D is fitted with a flat rotating specimen stage capable of accepting wafers up to 4"/100mm in diameter. The rotation speed is variable between preset limits and the stage to sputtering head distance can be adjusted between 25-71mm. A range of optional specimen stages can be fitted - see Options and Accessories.

Moulded case with colour touch screen
The Q300T D is presented in a custom moulded, one-piece case, allowing easy servicing access. The colour touch screen allows multiple users to input and store coating ‘recipes’. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 283mm/12” and comes with an integral implosion guard. The Q300T D can also be fitted with optional ‘vacuum shutdown’, which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.

Rapid data entry
At the operational heart of the Q300T D is a simple colour touch screen, which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. To further aid ease of use a number of typical sputter coating profiles are already stored. For added convenience, summaries of the last 100 coatings carried out can be viewed.

Maintenance
The intuitive touch screen interface features maintenance prompts that highlight:

* Time of last clean
* Coating time since last cleaned
* System ‘on time’
* Time of last service.

Additional Information

Options and Accessories (including details of standard specimen stage)
Specimen stages:
The Q300T D has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except rotary planetary stage). Rotation speed is variable between 14-38 RPM:

* Flat rotation stage for 4"/100mm wafers - fitted as standard
* Flat rotation stage for 6"/150mm wafers
* Rotation stage - 50mm Ø. This stage only rotates - no tilt or height adjustment
* Rotate-tilt stage - 50mm Ø with height adjustment (target to stage height variable between 30-80mm). The tilt angle can be pre-set (horizontal to 30°)
* Rotation stage for glass microscope slides.

Other options:
* Extended height chamber for taller specimens
* Dual channel film thickness monitor (FTM). The optional FTM attachment (10779) consists of a controller and quartz crystal oscillator built into the Q300T D and a vacuum feed-through, two chamber-mounted crystal holders and quartz crystals. As sputtered material is deposited onto the crystal, its frequency of oscillation is modified. This 'modification' is used to measure and control the thickness of material deposited.
Specifications
Instrument case 585mm W x 470mm D x 410mm H (total height with coating head open: 650mm)
Weight 36.6kg
Packed dimensions 725mm W x 660mm D x 680mm H (44.8kg)
Work chamber Borosilicate glass 283mm ID x 127mm H
Safety shield Integral polyethylene terephthalate (PET) cylinder
Display 145mm W x 320mm D x 240mm H colour graphic thin film transistor (TFT) display
User interface Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 100 coatings carried out and reminders for when maintenance is due
Sputter target Disc style 57mm Ø with thickness depending on the targets fitted. One 57mm Ø x 0.3mm thick chromium (Cr) target (TK8845) and one 57mm Ø x 0.1mm thick gold (Au) target (SC502-314A) fitted as standard.

Vacuum
High vacuum pumping Internally-mounted, 70L/s air-cooled turbomolecular pump
Rotary pump 50L/m two-stage rotary pump with oil mist filter (order separately, see EK3175)
Vacuum measurement Pirani gauge (a full range gauge is available as an option)
Typical ultimate vacuum 5x10-5mbar in a clean system after pre-pumping with dry nitrogen gas
Specimen stage Flat rotation stage for 4"/100mm wafers is fitted as standard. Rotation speed is variable between preset limits. For alternative stages see Options and Accessories

Processes
Sputtering 0-80mA to a pre-determined thickness (with the optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without 'breaking' vacuum and with built-in rest periods)

Services and other information
Gases Argon sputtering process gas, 99.999%
Nitrogen venting gas (optional)
Electrical supply 90-250V 50/60Hz 1,400VA including RV3 rotary pump power. 110/240V voltage selectable
Conformity CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, resulting in reduced running costs
Ordering Information
Q300T D Q300T D Dual Target Sequential Sputtering System. Includes one 57mm Ø x 0.3mm chromium (Cr) target (TK8845) and one 57mm Ø x 0.1mm thick gold (Au) target (SC502-314A). A flat rotation stage for 4"/100mm wafers is included

Rotary pump requirements (needs to be ordered separately)
EK3175 Edwards RV3 50L/s two-stage rotary pump, with vacuum hose, coupling kit and oil mist filter
11540 Diaphragm pump. A 'dry' alternative to the standard EK3175 oil-based rotary pump. Complete with vacuum hose, coupling kit and oil mist filter

Options and accessories
10994 Rotating specimen stage to accept 4"/100mm or 6"/150mm wafers, with rotation variable between preset limits
10357 Rotating 50mm Ø specimen stage with adjustable tilt. The platform has six specimen stub positions for 15mm, 10mm, 6.5mm or 1/8" pin stubs. The stage rotation speed is variable between preset limits. The target to stage height is variable between 0-42mm for standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height would be an additional 87mm
10067 50mm Ø variable height specimen stage with six stub positions for 15mm, 10mm, 6.5mm disc stubs or 1/8" pin stubs. Stage rotation speed variable between preset limits. NB: Target to stage height is variable between 10-53mm for standard stage. The stage is supplied with two mounting pillars; one provides 10-32mm target to stage distance, the other 31-53mm target to stage distance. An adjustable stop is used to set the height. When used with the extended height cylinder (optional accessory) the target to stage height would be an additional 87mm
10360 50mm Ø rotary tilting stage. A rotary planetary style stage with variable tilt angle from horizontal to 30°. The platform has six positions for either 15mm, 10mm, 6.5mm disc stubs or 1/8" SEM pin stubs. Rotation speed is variable between preset limits. NB: Depending on specimen height, this stage may require the optional extended height cylinder
10358 90mm Ø specimen stage for glass microscope slides (up to two x 75mm x 25mm slides or a single 75mm x 50mm slide). The stage can alternatively accommodate up to six 1/8" SEM pin stubs. The stage rotation speed is variable between preset limits. Includes a gear box to allow the optional FTM to be used
10779 Dual channel film thickness monitor (FTM). A fully integrated system using the Q300T D touch screen display for the control and display of all FTM functions. Allows automatic termination of the sputtering process at preselected thickness values. Displays rate for sputtering processes in nm/m, with a resolution of 0.1nm. Two FTM crystal holders are fixed in the chamber to give optimal position for both targets and to coat one material per crystal. Operating crystal frequency in the 5MHz to 400kHz operating range. Includes two spare C5460 quartz crystals
C5460 Spare quartz crystal
10596 Extended height vacuum chamber (214mm H - the standard chamber is 127mm H). For increased source to specimen distance and for coating large specimens
10442 Vacuum spigot allows more convenient connection of the vacuum hose to the rear of the Q300T D when bench depth is limited
11223 A lockable emergency stop (e-stop) switch which can be mounted on top of the system in a position easily accessible for the operator. It is provided with a key to release the knob after activation. NB: The addition of the e-stop does not inhibit or replace the normal on/off switch function. The e-stop can be retrofitted to existing systems
10428 Full range, active vacuum gauge capable of measurement over the range of 1,000mbar to 5x10-9mbar. Typical ultimate vacuum of the Q300T D is 5x10-5mbar. NB: Must be factory fitted
10576 Coating shields. Can be fitted to protect large surfaces from unwanted coating deposition - easily removable for ease of cleaning
11288 Spares kit, including: spare standard glass cylinder, 54mm Ø x 0.3mm chromium (Cr) target (TK8845) and 57mm Ø x 0.1mm gold (Au) target (SC502-314A), vacuum tubing with coupling insert, argon gas tubing, two sputter head magnets, rotary pump oil mist filter, FTM quartz crystal and fuses
Sputter targets NB: The Q300T D is fitted as standard with a 54mm Ø x 0.3mm chromium (Cr) target (TK8845) and 57mm Ø x 0.1mm gold (Au) target (SC502-314A). Other optional targets are available:
TK9000 Aluminium (Al) 57mm Ø x 0.76mm
TK8875 Aluminium (Al) 57mm Ø x 1.0mm
TK8869 Carbon (C) 54mm Ø x 1.5mm
TK8862 Chromium (Cr) 54mm Ø x 1.5mm
TK8845 Chromium (Cr) 54mm Ø x 0.3mm
TK8900 Cobalt (Co) 57mm Ø x 0.1mm
SC502-314H Copper (Cu) 57mm Ø x 0.1mm
SC502-314A Gold (Au) 57mm Ø x 0.1mm
SC502-314A/0.2mm Gold (Au) 57mm Ø x 0.2mm
TK8889 Gold (Au) 57mm Ø x 0.3mm
SC502-314B Gold/palladium (Au/Pd) (80:20) 57mm Ø x 0.1mm
SC502-314B/0.2mm Gold/palladium (Au/Pd) (80:20) 57mm Ø x 0.2mm
TK8891 Gold/palladium (Au/Pd) (60:40) 57mm Ø x 0.3mm
TK8907 Indium tin oxide (ITO) 57mm Ø x 3mm
TK8899 Iridium (Ir) 57mm Ø x 0.3mm
TK8897 Iron (Fe) 57mm Ø x 0.1mm
TK8905 Magnesium (Mg) 57mm Ø x 0.3mm
TK8903 Molybdenum (Mo) 57mm Ø x 0.1mm
SC502-314D Nickel (Ni) 57mm Ø x 0.1mm
SC502-314G Palladium (Pd) 57mm Ø x 0.1mm
SC502-314C Platinum (Pt) 57mm Ø x 0.1mm
SC502-314C/0.2mm Platinum (Pt) 57mm Ø x 0.2mm
TK8893 Platinum (Pt) 57mm Ø x 0.3mm
TK8887 Platinum/palladium (Pt/Pd) (80:20) 57mm Ø x 0.3mm
SC502-314E Silver (Ag) 57mm Ø x 0.1mm
TK8906 Tantalum (Ta) 57mm Ø x 0.1mm
TK8902 Tin (Sn) 57mm Ø x 0.1mm
TK8879 Titanium (Ti) 57mm Ø x 1.5mm
TK8895 Titanium (Ti) 57mm Ø x 0.5mm
TK8846 Tungsten (W) 57mm Ø x 0.5mm
TK8867 Tungsten (W) 57mm Ø x 0.2mm
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