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Sputter Coaters and SEM/ TEM Carbon Coaters

The Q Plus Series is the latest version of Quorum's internationally acclaimed, market-leading range of sputter and carbon coaters. They are increasingly used in high-resolution microscopy, where ultra-fine coating is a must. 

Sputter coating is the standard method for preparing non-conducting or poorly conducting specimens prior to observation in a scanning electron microscope (SEM). Quorum offer low-cost, rotary-pumped sputter coaters for depositing non-oxidising metals - such as gold (Au) and platinum (Pt) - and turbomolecular-pumped coaters, suitable for both oxidising and non-oxidising metals, such as chromium (Cr). 

To offer improved ultra-fine coating Quorum have introduced the NEW Q150V Plus, which offers an ultimate vacuum of 1 x 10-6mbar for superior results. 

Large chamber sputter coaters are available for specimens up to 200 mm in diameter. Most Quorum coaters can also be configured for carbon evaporation using easy-change carbon rod and carbon fibre inserts. 


Need help selecting the correct coater for your needs?

Then our "Coater Selection Guide" can help you.

For further assistance please contact our UK sales team on: +44(0)1323 810981 or email: sales@quorumtech.com.


Coaters for EM and thin film applications - a quick overview

The Q150V Plus is suitable for high-vacuum applications. This new product offers users the capability to produce finer grain size and thinner coating for ultra-high-resolution applications (above x 200k magnification).

The Q150T Plus coater is suitable for SEM, TEM and many thin film applications. It is available in three formats: as a sputter coater, carbon coater or both sputtering and carbon evaporation in a single compact system.

The rotary-pumped Q150R Plus coater is suitable for W-SEM sputtering applications using non-oxidising metals and for carbon coating SEM specimens for EDS and WDS.

For larger specimens, the Q300T T Plus (turbomolecular-pumped) models allow coating of a single large diameter specimen up to 8"/200 mm (e.g. a wafer), or multiple smaller specimens over a similar diameter. Both have triple sputtering heads to ensure even coating deposition. 

For thin film applications the Q300T D Plus Dual Target Sequential Sputter Coater allows consecutive metal layers to be sputtered without the need to break vacuum.

The Q150 GB is a modular version of the Q150T ES coater designed to be integrated into a glove box.

Completing the range is the SC7620, a compact, entry-level SEM sputter coater which is available with an optional carbon fibre evaporation attachment.

If you would like to talk to a member of our sales team in the UK about our market-leading coaters please call us on: +44(0)1323 810981 or email: sales@quorumtech.com.

SC7620 Mini Sputter Coater/Glow Discharge System

The SC7620 is a compact entry-level SEM sputter coater. When combined with the optional SC7620-CF carbon fibre evaporation attachment it makes the ideal low-cost SEM sputtering and carbon coating system package. Additionally, the SC7620 is fitted as standard with a glow discharge function, making it ideal for the hydrophilisation, or ’wetting’, of carbon-coated TEM grids and for other surface modifications.

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Q150V Plus - for ultra-fine coatings

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1x10-6 mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging. The lower background pressure removes oxygen nitrogen and water vapour from the chamber, avoiding chemical reactions during the sputter process, which could otherwise lead to impurities or defects in the coatings. Similarly, lower scattering allows for high purity, amorphous carbon films of high density. The Q150V Plus offers all the benefits of the Q150T Plus, but with a finer grain size and thinner coating, for ultra-high-resolution applications (above x 200,000 magnification).

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Q150R Plus - Rotary Pumped Coater

The Q150R Plus is suitable for use with Tungsten/LaB6 SEM and Benchtop SEM.

The Q150R Plus is available in three formats: 

  • Sputtering (Q150R Plus S)
  • Carbon fibre evaporation (Q150R Plus E) 
  • Sputtering and carbon cord evaporation (Q150R Plus ES)

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Q150T Plus - Turbomolecular pumped coater

The Q150T Plus is optimised for use with a turbomolecular pump, which gives a lower vacuum down to 5 x 10-5 mbar. 

The Q150T Plus is available in three formats: 

  •  An automatic sputter coater for non-oxidising metals (Q150T S Plus)
  •  An automatic carbon coater (rod/cord) for SEM applications (Q150T E Plus) 
  •  A combined system capable of both sputtering and carbon coating (Q150T ES Plus)

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Q150 GB Turbo-Pumped Sputter Coater / Carbon Coater for Glove Box

The Q150GB is a modular glove box version of the market-leading Q150T ES bench top turbomolecular-pumped coating system - suitable for SEM, TEM and many thin-film applications. The Q150 GB comes as standard with sputtering and carbon rod evaporation inserts and a rotating specimen stage. Options include a metal evaporation, glow discharge, film thickness measurement and special stages to suit a range of specimen types

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Q300T T Plus - triple target sputter coater for specimens up to 200mm diameter

The Q300T T Plus is a large chamber, turbo-pumped coating system, ideally suited for sputtering a single large diameter specimen up to 8"/200mm or multiple smaller specimens over a similar diameter. Ideal for thin-film applications and SEM/FE-SEM. It is fitted with three sputtering heads to ensure even deposition of individual large specimens or multiple specimens. 

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Q300T D Plus - dual target sequential sputtering for specimens up to 150 mm diameter

Suitable for multi-layer sequential sputtering of two materials, the Q300T D Plus has two independent sputtering heads, which allows sequential sputtering of two metals without the need to break vacuum. The system is fully automated with user defined recipes controlling the pumping sequence, time, number of sputter cycles, and the current used during the process. Unlimited layers of varying thickness from two target materials can be sputtered sequentially by cycling between both targets.  When not in use the targets are shuttered for protection from contamination. 

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