The Q150R Plus is available in three configurations:

• Q150R S Plus – an automatic sputter coater for non-oxidising metals. Available sputtering targets including gold, gold/palladium and platinum. 
• Q150R E Plus – an automatic carbon cord coater for SEM applications such as EDS and WDS.
• Q150R ES Plus – a combined system system capable of both sputtering and carbon coating. The deposition heads can be swapped in seconds.

Recommended applications for Q150R Plus:

• Low and medium magnifications
• SE signal boost (improved SE yield) when coating with as litte as 1nm or less of Au, Au/Pd, Pt
• Table-top SEM coating
• Elemental analysis
• Copper metallisation layers for SEM

These products are for Research Use Only. 

New user interface has been thoroughly updated:

• Capacitive touch screen is more sensitive for ease of use
• User interface software has been extensively revised, using a modern smartphone-style interface
• Comprehensive context-sensitive help screen
• USB interface allows easy software updates and backing up/copying of recipe files to USB stick
• Process log files can be exported via USB port in .csv format for analysis in Excel or similar. Log files include date, time and process parameters.
• 16GB of flash memory can store more than 1000 recipes
• Dual-core ARM processor for a fast, responsive display

Allows multiple users to input and store coating recipes, with a new feature to sort recipes per user according to recent use.

Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process.

System prompts user to confirm target material and it then automatically selects appropriate parameters for that material.

Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating profiles are already  stored but also allows the user to create their own.

Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating.

Automatic, controlled pulsed carbon cord evaporation

The carbon evaporation process can be terminated using the optional film thickness monitor, which incorporates a quartz crystal monitor. This recipe ensures that carbon is evaporated in short controlled pulses,  which  has two effects; protecting the sample from heating and ensuring the accuracy of the film thickness monitor. Pulsing also significantly reduces the amount of debris (including large carbon fragments) associated with traditional carbon “flash” evaporation. Pulsed and ramped carbon rod recipes are supplied as standard.

Cool magnetron sputtering

Sputter coating is a technique widely used in various applications; it is possible to create a plasma and  sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it will heat the sample and can result in damage when the plasma interacts  with the sample. The Q series uses low temperature enhanced-plasma magnetrons optimised for the rotary pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.

The Q150R S Plus and Q150R ES Plus use easy-change, 57 mm diameter, disc-style targets which are designed to sputter non-oxidising (noble) metals – ideal for W-SEM applications. The Q150R S Plus and Q150R ES Plus are fitted as standard with a gold (Au) sputter target.

Other targets options include; Au/Pd, Pt/Pd, Pd, and Cu. Platinum (Pt) can also be sputtered with the optional Pt coating vacuum hose assembly.

Interchangeable plug-in heads

This allows the user to configure the system as a sputter coater, evaporator or glow discharge system – all in one space saving format. A carbon cord evaporation insert is available as an option. Automatic detection of the head type when changed.

Detachable chamber with built-in implosion guard

Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.

Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.

Tall chamber option is available for carbon evaporation to avoid sample heating, to improve uniformity for sputtering and to hold taller samples.

Multiple stage options

The Q150R Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Some examples:

• Rotation stage (supplied as standard): 50 mm Ø can accommodate six standard stubs. Height can be pre-set.
• Rotate-tilt stage for improved uniform coating: 50 mm Ø. Tilt and height can be pre-set.
• Variable angle, rotary planetary stage for heavily contoured samples
• Large flat rotation stage with offset gear box for 4”/100 mm wafers
• Rotation stage for glass microscope slides

Other options are available on request.

Safety

The Q150R Plus meets key industry CE standards

• All electronic components are protected by covers
• Implosion guard prevents user injury in event of chamber failure
• Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
• Electrical interlocks remove power when source head cover opened
• Overheating protection shuts down power supply

No. Q150RSPLUS
Q150R S Plus Sputter Coater. Fully automatic, capacitive touch-screen controlled  rotary pumped sputter coater with status LED indicator. Including 10587 quick release sputter insert and one SC502-314A 57mm diameter x 0.1mm gold target. 10067 rotating specimen stage, 50mm diameter, supplied as standard.

No.Q150REPLUS
Q150R E Plus Carbon Evaporator. Fully automatic, capacitive touch-screen controlled rotary pumped carbon fibre evaporation coater with status LED indicator. Including 10355 quick-release carbon fibre insert for evaporation of carbon cord. Supplied with C5421 carbon fibre cord, 10067 rotating specimen stage, 50mm diameter, supplied as standard

No. Q150RESPLUS
Q150R ES Combined Sputtering and Carbon Coating System. Consists of fully automatic, capacitive touch-screen controlled rotary pumped sputter coater and carbon evaporator with status LED indicator. Including 10587 quick release sputter insert and one SC502-314A 57mm diameter x 0.1mm gold target, and carbon fibre evaporation coater, including 10355 quick-release carbon fibre insert for evaporation of carbon cord. Coating inserts are interchangeable and can be swapped in seconds. The intelligent system logic automatically recognises which insert is in place and displays the appropriate operating settings. 10067 rotating specimen stage, 50mm diameter, supplied as standard.Q150R E Plus Carbon Evaporator. Fully automatic, capacitive touch-screen controlled rotary pumped carbon fibre evaporation coater with status LED indicator. Including 10355 quick-release carbon fibre insert for evaporation of carbon cord. Supplied with C5421 carbon fibre cord, 10067 rotating specimen stage, 50mm diameter, supplied as standard.

Rotary pump requirements

13034. Pfeiffer pump 5 m³/hr two-stage rotary pump with oil mist filter. See: Rotary Pumps and Dry Pumps for details.

Options and accessories

Head inserts and glow discharge

10879. Carbon rod evaporation insert for 3.05 mm Ø rods (R E and R ES only). Includes carbon rod shaper 13232 and wedge tool 2097. C5422 (3.05 mm Ø x 300 mm packet of ten) carbon rods.

10726. Additional sputter insert for quick metal change (RE and R ES version only). NB: this is an entire sputtering assembly – individual targets can also be purchased

10262. Glow discharge insert. Used to modify surface properties (e.g. hydrophobic to hydrophilic conversion) (R S and R ES versions only). Can be retrofitted.

Specimen stages 

All rotating stages have variable rotation of between 8 and 20 rpm.

10067.  50 mm stage

10357. Tilt stage assembly. 50 mm diameter specimen stage with adjustable tilt up to 90 degrees. 

10358. Specimen stage for glass microscope slides (up to two x 75 mm x 25 mm slides).

10360. “Rotacota” type stage assembly. Variable tilt angle, planetary stage, rotational speed 8-20rpm

10458. 4″ Wafer stage and gearbox assembly

10787. 4” wafer stage. A flat 4″/102 mm flat, drop-in wafer stage which accepts 2″, 3″, 4″ wafers

23850.  Tilt stage sub-assembly 4″

10788.  4″ Stub holder

10808. Eight-place stub stage. For 25 mm and 30 mm Ǿ stubs

10856. 14-place stub stage. For 25 mm and 30 mm Ǿ stubs

12043. Cover slip stage. 92 mm Ǿ stage accepts nine 20 x 20 mm cover slips.

12305 Four-place 25 mm stub stage

Other options and accessories

10454. Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and quartz crystals.

C5460. Spare quartz crystal.

10429. Extended height vacuum chamber. (214 mm high – the standard chamber is 127 mm high). For increased source-to- specimen distance and for coating large specimens.

10731. Rotating vacuum spigot. Allows a more convenient connection of the vacuum hose to the rear of the Q150R Plus – useful for when bench depth is limited.

13530. Standard coating shield assembly.

11880. Extend height coating shield assembly.

10068.  Additional standard glass cylinder assembly. Includes standard glass chamber, implosion guard and gaskets.

13711. Platinum coating vacuum hose assembly. Recommended for if platinum (Pt) is to be sputtered (R S and R ES versions only)

Sputter targets

The Q150R Plus S and Q150R Plus ES are fitted as standard with a 0.1 mm thick gold (Au) target (SC502-314A). Targets are 57 mm Ø x 0.1 mm thick (unless specified otherwise).

SC502-314A. Gold (Au).

SC502-314A/0.2 mm. Gold (Au) 0.2 mm.

TK8889. Gold (Au) 0.3 mm.

TK8891. Gold/palladium (Au/Pd – 80:20) 0.3 mm.

SC502-314B. Gold/palladium (Au/Pd).

SC502-314B/0.2mm. Gold/palladium (Au/Pd – 80:20) 0.2 mm.

SC502-314C. Platinum (Pt).

SC502-314C/0.2mm. Platinum (Pt) 0.2 mm.

TK8893. Platinum (Pt) 0.3 mm.

TK8887. Platinum/palladium (Pt/Pd – 80:20%) 0.3 mm.

SC502-314E. Silver (Ag).

SC502-314G. Palladium (Pd).

SC502-314H. Copper (Cu).

Carbon supplies

C5421. Carbon cord – 1 m.

C5421-10. Carbon cord – 10 m.

C5421-100. Carbon cord – 100 m.

C5422.  Carbon rods – 3.05mm dia x 300mm length (unshaped) pack of 10

C5461.  Carbon fibre – fine strands (1m)

C5461-10.  Carbon fibre – fine strands (10m)

C5461-100.  Carbon fibre – fine strands (100m)

13232. Manual carbon rod shaper 1.2 mm and 1.4 mm Ø carbon rods.

12097.  Wedge tool

Other consumables and spare kits

10730. Two-year spares kit for Q150R Plus S. Includes: SC502-314A 57 mm Ø x 0.1 mm gold (Au) target, standard glass chamber assembly, C5460 quartz crystals, O-rings etc.

10729. Two-year spares kit for Q150R Plus E. Includes: C5421 carbon cord, standard glass chamber assembly, C5460 quartz crystals, O-rings, springs etc.

10728. Two-year spares kit for Q150R Plus ES. Includes: SC502-314A 57 mm Ø x 0.1 mm gold (Au) target, C5421 carbon cord, standard glass chamber assembly, C5460 quartz crystals, O-rings, springs etc.

O7803.  Basic oil mist filter (spare)

13233.  Pump oil 1 litre

13235.  Pump oil 5 litre

23606.  L Gasket (each)

Instrument case

585 mm W x 535 mm D x 410 mm H

(total height with coating head open: 650 mm)

Weight

28 kg (packed: 42 kg)

Packed dimensions

725 mm W x 660 mm D x 680 mm H

Work chamber

Borosilicate glass 150 mm ID x 127 mm H

Display

115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display

User interface

Full graphical interface with touch screen buttons includes features such as a log of the last 1000 coatings and reminders for when maintenance is due.

Sputter target

Disc-style 57 mm Ø. 0.1 mm thick gold (Au) target is fitted as standard. R S and R ES versions only

Specimen stage

50 mm Ø rotation stage with rotation speed of 8-20 rpm.

Other stages available on request.

Vacuum

Rotary pump: optional 5 m3/hr two-stage rotary pump with oil mist filter (order separately)

Vacuum measurement: Pirani gauge

Ultimate vacuum: 2 x 10^-2 mbar*

Sputter vacuum range: Between 2 x 10^-2 and 1 x 10 ^-1 mbar for gold

*Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping with dry nitrogen gas

Processes

Sputtering: Sputter current 1-80 mA to a predetermined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without breaking vacuum and with automatically built-in cooling periods)

Carbon evaporation: A robust, ripple-free DC power supply featuring pulse evaporation ensures reproducible carbon evaporation from cord sources. Current pulse: 30-75 A current.

Visual status indicator

A large multi-colour status indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance.

The indicator LED shows the following states:

•  Initialisation

•  Process running

•  Idle

•  Coating in progress

•  Process completed

•  Process ended in fault condition

Audio indication also sounds on completion of the process.