Sputter and Carbon Coaters

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    Q150R Plus – Rotary Pumped Coater

    The Q150R Plus is suitable for use with Tungsten/LaB6 SEM and Benchtop SEM.

    Typical uses:

    Sputter coating of noble metals using the Q150R S & ES Plus:

    Recommended for magnifications:

    •  up to x 50k using Au, Au/Pd

    •  up to x 100k using Pt (optional)

    Carbon cord coating for elemental analysis using the Q150R E & ES Plus.

    Key features

    • Capable of achieving vacuum of 2 x 10-2 mbar
    • New touch and swipe capacitive screen
    • USB port for upgrades and download of log files
    • Multiple-user profiles can be set up on one machine
    • New software sorts recipes per user, according to recent use
    • 16GB of memory can store more than 1000 recipes
    • New multi-colour LED visual status indicator
    • Interchangeable stage options and plug-in heads

    Click to download the product brochure

    • Product Description
    • Images
    • Ordering information
    • Additional Information
    • Downloads & Specifications

    The Q150R Plus is available in three configurations:

    • Q150R S Plus  an automatic sputter coater for non-oxidising metals. Available sputtering targets including gold, gold/palladium and platinum. 
    • Q150R E Plus – an automatic carbon cord coater for SEM applications such as EDS and WDS.
    • Q150R ES Plus – a combined system system capable of both sputtering and carbon coating. The deposition heads can be swapped in seconds.

    Recommended applications for Q150R Plus:

    • Low and medium magnifications
    • SE signal boost (improved SE yield) when coating with as litte as 1nm or less of Au, Au/Pd, Pt
    • Table-top SEM coating
    • Elemental analysis
    • Copper metallisation layers for SEM

    These products are for Research Use Only. 

    New user interface has been thoroughly updated:

    • Capacitive touch screen is more sensitive for ease of use
    • User interface software has been extensively revised, using a modern smartphone-style interface
    • Comprehensive context-sensitive help screen
    • USB interface allows easy software updates and backing up/copying of recipe files to USB stick
    • Process log files can be exported via USB port in .csv format for analysis in Excel or similar. Log files include date, time and process parameters.
    • 16GB of flash memory can store more than 1000 recipes
    • Dual-core ARM processor for a fast, responsive display

    Allows multiple users to input and store coating recipes, with a new feature to sort recipes per user according to recent use.

    Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process.

    System prompts user to confirm target material and it then automatically selects appropriate parameters for that material.

    Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating profiles are already  stored but also allows the user to create their own.

    Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating.

    Automatic, controlled pulsed carbon cord evaporation

    The carbon evaporation process can be terminated using the optional film thickness monitor, which incorporates a quartz crystal monitor. This recipe ensures that carbon is evaporated in short controlled pulses,  which  has two effects; protecting the sample from heating and ensuring the accuracy of the film thickness monitor. Pulsing also significantly reduces the amount of debris (including large carbon fragments) associated with traditional carbon “flash” evaporation. Pulsed and ramped carbon rod recipes are supplied as standard.

    Cool magnetron sputtering

    Sputter coating is a technique widely used in various applications; it is possible to create a plasma and  sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it will heat the sample and can result in damage when the plasma interacts  with the sample. The Q series uses low temperature enhanced-plasma magnetrons optimised for the rotary pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.

    The Q150R S Plus and Q150R ES Plus use easy-change, 57 mm diameter, disc-style targets which are designed to sputter non-oxidising (noble) metals – ideal for W-SEM applications. The Q150R S Plus and Q150R ES Plus are fitted as standard with a gold (Au) sputter target.

    Other targets options include; Au/Pd, Pt/Pd, Pd, and Cu. Platinum (Pt) can also be sputtered with the optional Pt coating vacuum hose assembly.

    Interchangeable plug-in heads

    This allows the user to configure the system as a sputter coater, evaporator or glow discharge system – all in one space saving format. A carbon cord evaporation insert is available as an option. Automatic detection of the head type when changed.

    Detachable chamber with built-in implosion guard

    Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.

    Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.

    Tall chamber option is available for carbon evaporation to avoid sample heating, to improve uniformity for sputtering and to hold taller samples.

    Multiple stage options

    The Q150R Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage). Some examples:

    • Rotation stage (supplied as standard): 50 mm Ø can accommodate six standard stubs. Height can be pre-set.
    • Rotate-tilt stage for improved uniform coating: 50 mm Ø. Tilt and height can be pre-set.
    • Variable angle, rotary planetary stage for heavily contoured samples
    • Large flat rotation stage with offset gear box for 4”/100 mm wafers
    • Rotation stage for glass microscope slides

    Other options are available on request.


    The Q150R Plus meets key industry CE standards

    • All electronic components are protected by covers
    • Implosion guard prevents user injury in event of chamber failure
    • Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being opened
    • Electrical interlocks remove power when source head cover opened
    • Overheating protection shuts down power supply

    No. Q150RSPLUS
    Q150R S Plus Sputter Coater. Fully automatic, capacitive touch-screen controlled  rotary pumped sputter coater with status LED indicator. Including 10587 quick release sputter insert and one SC502-314A 57mm diameter x 0.1mm gold target. 10067 rotating specimen stage, 50mm diameter, supplied as standard.

    Q150R E Plus Carbon Evaporator. Fully automatic, capacitive touch-screen controlled rotary pumped carbon fibre evaporation coater with status LED indicator. Including 10355 quick-release carbon fibre insert for evaporation of carbon cord. Supplied with C5421 carbon fibre cord, 10067 rotating specimen stage, 50mm diameter, supplied as standard

    No. Q150RESPLUS
    Q150R ES Combined Sputtering and Carbon Coating System. Consists of fully automatic, capacitive touch-screen controlled rotary pumped sputter coater and carbon evaporator with status LED indicator. Including 10587 quick release sputter insert and one SC502-314A 57mm diameter x 0.1mm gold target, and carbon fibre evaporation coater, including 10355 quick-release carbon fibre insert for evaporation of carbon cord. Coating inserts are interchangeable and can be swapped in seconds. The intelligent system logic automatically recognises which insert is in place and displays the appropriate operating settings. 10067 rotating specimen stage, 50mm diameter, supplied as standard.Q150R E Plus Carbon Evaporator. Fully automatic, capacitive touch-screen controlled rotary pumped carbon fibre evaporation coater with status LED indicator. Including 10355 quick-release carbon fibre insert for evaporation of carbon cord. Supplied with C5421 carbon fibre cord, 10067 rotating specimen stage, 50mm diameter, supplied as standard.

    Rotary pump requirements

    13034. Pfeiffer pump 5 m3/hr two-stage rotary pump with oil mist filter. See: Rotary Pumps and Dry Pumps for details.

    Options and accessories

    Head inserts and glow discharge

    10879. Carbon rod evaporation insert for 3.05 mm Ø rods (R E and R ES only). Includes carbon rod shaper 13232 and wedge tool 2097. C5422 (3.05 mm Ø x 300 mm packet of ten) carbon rods.

    10726. Additional sputter insert for quick metal change (RE and R ES version only). NB: this is an entire sputtering assembly – individual targets can also be purchased

    10262. Glow discharge insert. Used to modify surface properties (e.g. hydrophobic to hydrophilic conversion) (R S and R ES versions only). Can be retrofitted.

    Specimen stages 

    All rotating stages have variable rotation of between 8 and 20 rpm.

    10067.  50 mm stage

    10357. Tilt stage assembly. 50 mm diameter specimen stage with adjustable tilt up to 90 degrees. 

    10358. Specimen stage for glass microscope slides (up to two x 75 mm x 25 mm slides).

    10360. “Rotacota” type stage assembly. Variable tilt angle, planetary stage, rotational speed 8-20rpm

    10458. 4″ Wafer stage and gearbox assembly

    10787. 4” wafer stage. A flat 4″/102 mm flat, drop-in wafer stage which accepts 2″, 3″, 4″ wafers

    23850.  Tilt stage sub-assembly 4″

    10788.  4″ Stub holder

    10808. Eight-place stub stage. For 25 mm and 30 mm Ǿ stubs

    10856. 14-place stub stage. For 25 mm and 30 mm Ǿ stubs

    12043. Cover slip stage. 92 mm Ǿ stage accepts nine 20 x 20 mm cover slips.

    12305 Four-place 25 mm stub stage

    Other options and accessories

    10454. Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and quartz crystals.

    C5460. Spare quartz crystal.

    10429. Extended height vacuum chamber. (214 mm high – the standard chamber is 127 mm high). For increased source-to- specimen distance and for coating large specimens.

    10731. Rotating vacuum spigot. Allows a more convenient connection of the vacuum hose to the rear of the Q150R Plus – useful for when bench depth is limited.

    13530. Standard coating shield assembly.

    11880. Extend height coating shield assembly.

    10068.  Additional standard glass cylinder assembly. Includes standard glass chamber, implosion guard and gaskets.

    13711. Platinum coating vacuum hose assembly. Recommended for if platinum (Pt) is to be sputtered (R S and R ES versions only)

    Sputter targets

    The Q150R Plus S and Q150R Plus ES are fitted as standard with a 0.1 mm thick gold (Au) target (SC502-314A). Targets are 57 mm Ø x 0.1 mm thick (unless specified otherwise).

    SC502-314A. Gold (Au).

    SC502-314A/0.2 mm. Gold (Au) 0.2 mm.

    TK8889. Gold (Au) 0.3 mm.

    TK8891. Gold/palladium (Au/Pd – 80:20) 0.3 mm.

    SC502-314B. Gold/palladium (Au/Pd).

    SC502-314B/0.2mm. Gold/palladium (Au/Pd – 80:20) 0.2 mm.

    SC502-314C. Platinum (Pt).

    SC502-314C/0.2mm. Platinum (Pt) 0.2 mm.

    TK8893. Platinum (Pt) 0.3 mm.

    TK8887. Platinum/palladium (Pt/Pd – 80:20%) 0.3 mm.

    SC502-314E. Silver (Ag).

    SC502-314G. Palladium (Pd).

    SC502-314H. Copper (Cu).

    Carbon supplies

    C5421. Carbon cord – 1 m.

    C5421-10. Carbon cord – 10 m.

    C5421-100. Carbon cord – 100 m.

    C5422.  Carbon rods – 3.05mm dia x 300mm length (unshaped) pack of 10

    C5461.  Carbon fibre – fine strands (1m)

    C5461-10.  Carbon fibre – fine strands (10m)

    C5461-100.  Carbon fibre – fine strands (100m)

    13232. Manual carbon rod shaper 1.2 mm and 1.4 mm Ø carbon rods.

    12097.  Wedge tool

    Other consumables and spare kits

    10730. Two-year spares kit for Q150R Plus S. Includes: SC502-314A 57 mm Ø x 0.1 mm gold (Au) target, standard glass chamber assembly, C5460 quartz crystals, O-rings etc.

    10729. Two-year spares kit for Q150R Plus E. Includes: C5421 carbon cord, standard glass chamber assembly, C5460 quartz crystals, O-rings, springs etc.

    10728. Two-year spares kit for Q150R Plus ES. Includes: SC502-314A 57 mm Ø x 0.1 mm gold (Au) target, C5421 carbon cord, standard glass chamber assembly, C5460 quartz crystals, O-rings, springs etc.

    O7803.  Basic oil mist filter (spare)

    13233.  Pump oil 1 litre

    13235.  Pump oil 5 litre

    23606.  L Gasket (each)

    Instrument case

    585 mm W x 535 mm D x 410 mm H

    (total height with coating head open: 650 mm)


    28 kg (packed: 42 kg)

    Packed dimensions

    725 mm W x 660 mm D x 680 mm H

    Work chamber

    Borosilicate glass 150 mm ID x 127 mm H


    115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display

    User interface

    Full graphical interface with touch screen buttons includes features such as a log of the last 1000 coatings and reminders for when maintenance is due.

    Sputter target

    Disc-style 57 mm Ø. 0.1 mm thick gold (Au) target is fitted as standard. R S and R ES versions only

    Specimen stage

    50 mm Ø rotation stage with rotation speed of 8-20 rpm.

    Other stages available on request.


    Rotary pump: optional 5 m3/hr two-stage rotary pump with oil mist filter (order separately)

    Vacuum measurement: Pirani gauge

    Ultimate vacuum: 2 x 10-2 mbar*

    Sputter vacuum range: Between 2 x 10-2 and 1 x 10 -1 mbar for gold

    *Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping with dry nitrogen gas


    Sputtering: Sputter current 1-80 mA to a predetermined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without breaking vacuum and with automatically built-in cooling periods)

    Carbon evaporation: A robust, ripple-free DC power supply featuring pulse evaporation ensures reproducible carbon evaporation from cord sources. Current pulse: 30-75 A current.

    Visual status indicator

    A large multi-colour status indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance.

    The indicator LED shows the following states:

    •  Initialisation

    •  Process running

    •  Idle

    •  Coating in progress

    •  Process completed

    •  Process ended in fault condition

    Audio indication also sounds on completion of the process.



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