Send me a Q150R quote

Q150R Rotary-Pumped Sputter Coater/Carbon Coater

The Q150R is a compact rotary-pumped coating system suitable for SEM sputtering with non-oxidising (noble) metals - e.g. gold (Au), gold/palladium (Au/Pd) and platinum (Pt) - and for carbon coating SEM specimens for EDS and WDS.

The Q150R is available in three formats: sputtering (Q150R S), carbon fibre coating (Q150R E) and a combined sputtering and carbon fibre coating system (Q150R ES).

Key features
  • Metal sputtering or carbon coating, or both - in one space-saving format
  • Rotary-pumped sputter coating - allows sputtering of a range of non-oxidising (noble) metals (e.g. Au, Pt, Ag and Pd)
  • Carbon fibre coating - ideal for SEM carbon coating applications (EDS and WDS)
  • Controlled pulse carbon cord evaporation - precise control, reduced carbon debris
  • Precise thickness control using the film thickness monitor option
  • Fully automatic touch screen control - rapid data input, simple operation
  • Easy-to-change, drop-in style specimen stages (rotation stage as standard)
  • Extended warranty option
Click to download Brochure

Ideal for W-SEM sputtering and carbon coating applications

The Q150R is a rotary pumped coater available in three formats: sputtering, carbon evaporation or both. Depending upon the selected configuration, the Q150R can be a sputter coater for scanning electron microscopy (SEM), a carbon coater suitable for SEM (e.g. EDS and WDS), or both in a single, easy-to-use system.

Note: For field emission (FE) SEM and for TEM-quality carbon coating, please the turbo-molecular pumped Q150T 

Molded case with colour touch screen

The Q150R is presented in a custom-molded, one-piece case which allows easy access for servicing. The embedded, colour touch screen allows multiple users to input and store coating ‘recipes’. The case houses all the working components, including an automatic bleed control that ensures optimum vacuum conditions during sputtering.

The vacuum chamber has an internal diameter of 150 mm/6” and comes with an integral implosion (safety) guard. 

A variable-speed rotary specimen stage is fitted as standard with other stages available as options. For further details see: Additional Information. 

Sputter coating, carbon coating - or both

The Q150R is available in three formats, each with a range of optional accessories:

  • Q150R S

A rotary-pumped sputter coater for non-oxidising (noble) metals. A gold (Au) target is fitted as standard, with other metals - such as gold/palladium (Au/Pd) and platinum (Pt) - available as options.

  • Q150R E

A compact rotary-pumped carbon fibre coater, suitable for W-SEM EDS and WDS applications. Fitted as standard with a carbon fibre evaporation head insert, an optional carbon rod insert is also available.

  • Q150R ES

A combined system with both sputtering and carbon coating. The deposition inserts can be swapped in seconds and the intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process.

All models can be fitted with a range of optional accessories (a carbon rod coating insert, film thickness monitor, glow discharge etc.). See: Additional Information for more details.

Platinum sputtering

Please note that for sputtering platinum (Pt) the optional 13711 Pt coating vacuum hose assembly is required .

Controlled pulse carbon cord evaporation

Installed as standard on E and ES models, controlled profiles ensure carbon is evaporated in short pulses. This significantly reduces or eliminates the amount debris (large carbon fragments) associated with traditional carbon "flash" evaporation. Plus it allows carbon cord evaporation to be accurately controlled using the optional film thickness monitor (FTM) accessory.

Rapid data entry

At the operational heart of the Q150R is a simple colour touch screen, which allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating profiles are already stored.


The intuitive touch screen interface features maintenance prompts which highlights time of the last clean, coating time since last clean, system ‘on time' and time of the last service.

Pumping requirement

A suitable rotary vacuum pump is required. The Pfeiffer DUO 6  5 m3/hr two-stage rotary vacuum pump is ideal for this purpose. See: Ordering Information for further details.

Options and accessories

The Q150R has an extensive range of options and accessories, including a glow discharge insert, film thickness monitor (FTM) and specimens stages to suit most applications. For details see: Additional Information.

Ordering Information

10417. Q150R S. Rotary-Pumped Sputter Coater, including an SC502-314A 57 mm Ø x 0.1 mm gold (Au) sputter target.

10419. Q150R E. Rotary-Pumped SEM Carbon Coater suitable for SEM applications. Fitted with a carbon fibre evaporation insert. Supplied with 1 m of standard carbon fibre cord (C5421).

10418. Q150R ES. Rotary-Pumped Sputter Coater and SEM Carbon Coater, including an SC502-314A 57 mm x Ø 0.1 mm gold (Au) target and 1 m of carbon carbon fibre cord (C5421).

Rotary pump requirements

13034. Vacuum pump. 5 m3/hr Pfeiffer DUO 6 two-stage rotary pump with oil mist filter. See: Rotary Pumps and Dry Pumps for details.

Options and accessories

Head inserts and glow discharge

10879. Carbon rod evaporation insert for 3.05 mm Ø rods (R E and R ES only). Includes carbon rod shaper 13232 and wedge tool 2097. C5422 (3.05 mm Ø x 300 mm packet of ten) carbon rods.

10726. Additional sputter insert for quick metal change (RE and R ES version only). NB: this is an entire sputtering assembly - individual targets can also be purchased

10262. Glow discharge insert. Used to modify surface properties (e.g. hydrophobic to hydrophilic conversion) (R S and R ES versions only). Can be retrofitted.

Specimen stages 

All rotating stages have variable rotation of between 8 and 20 rpm.

10357. Variable tilt angle specimen stage. With adjustable tilt up to 900 x 50 mm Ø and a specimen platform with six stub positions for 15 mm or 6.5 mm or 1/8" pin stubs

10360. Variable angle, rotary planetary specimen stage. A 50 mm Ø specimen platform with six stub positions for 15 mm or 6.5 mm or 1/8" pin stubs.

10358. Specimen stage for glass microscope slides (up to two x 75 mm x 25 mm slides). Includes a gear box to allow the optional FTM to be used.

10458. Flat rotation specimen stage for 4"/100 mm wafers. Includes gear box for increased coating area coverage.

10787. 4” wafer stage.

10808. Eight-place stub stage. For 25 mm and 30 mm Ǿ stubs

10856. 14-place stub stage. For 25 mm and 30 mm Ǿ stubs

11847. Fibre stage. Rotates fibres (up to 1 mm Ǿ) to ensure even coating on all sides.

12043. Cover slip stage. 92 mm Ǿ stage accepts nine 20 x 20 mm cover slips.

12305 Four-place 25 mm stub stage

Other options and accessories

10454. Film thickness monitor (FTM) attachment. Including oscillator, feed-through, quartz crystal holder and quartz crystals.

C5460. Spare quartz crystal.

10429. Extended height vacuum chamber. (214 mm high - the standard chamber is 127 mm high). For increased source-to- specimen distance and for coating large specimens.

10422. Rotating vacuum spigot. Allows a more convenient connection of the vacuum hose to the rear of the Q150R - useful for when bench depth is limited.

13530. Standard coating shield assembly. 

11880. Extend height coating shield assembly.

13711. Platinum coating vacuum hose assembly. Recommended for if platinum (Pt) is to be sputtered (R S and R ES versions only)

Sputter targets

The Q150R S and Q150R ES are fitted as standard with a 0.1 mm thick gold (Au) target (SC502-314A). Targets are 57 mm Ø x 0.1 mm thick (unless specified otherwise).

SC502-314A. Gold (Au).

SC502-314A/0.2 mm. Gold (Au) 0.2 mm.

TK8889. Gold (Au) 0.3 mm.

TK8891. Gold/palladium (Au/Pd - 80:20) 0.3 mm.

SC502-314B. Gold/palladium (Au/Pd).

SC502-314B/0.2mm. Gold/palladium (Au/Pd - 80:20) 0.2 mm.

SC502-314C. Platinum (Pt).

SC502-314C/0.2mm. Platinum (Pt) 0.2 mm.

TK8893. Platinum (Pt) 0.3 mm.

TK8887. Platinum/palladium (Pt/Pd - 80:20%) 0.3 mm.

SC502-314E. Silver (Ag).

SC502-314G. Palladium (Pd).

SC502-314H. Copper (Cu).

Carbon supplies

A0830A. Carbon rods - 6.15 mm Ø x 100 mm length (unshaped) - pack of 10.

C5421. Carbon fibre cord - 1 m.

C5421-10. Carbon fibre cord - 10 m.

C5421-100. Carbon fibre cord - 100 m.

13232. Manual carbon rod shaper 1.2 mm and 1.4 mm Ø carbon rods.

Other consumables and spare kits

10730. Two-year spares kit for Q150R S. Includes: SC502-314A 57 mm Ø x 0.1 mm gold (Au) target, standard glass chamber assembly, C5460 quartz crystals, O-rings etc.

10729. Two-year spares kit for Q150R E. Includes: C5421 carbon fibre cord, standard glass chamber assembly, C5460 quartz crystals, O-rings, springs etc.

10728. Two-year spares kit for Q150R ES. Includes: SC502-314A 57 mm Ø x 0.1 mm gold (Au) target, C5421 carbon fibre cord, standard glass chamber assembly, C5460 quartz crystals, O-rings, springs etc.

Additional product information

Glow Discharge Attachment 

The primary application of glow discharge is as a technique for the surface modification (wetting) of newly evaporated transmission electron microscopy (TEM) carbon support films.


Freshly-made TEM carbon support films tend to have hydrophobic surfaces which inhibits the spreading of suspensions of particles in negative staining solutions. However, after glow discharge treatment with air, the carbon film is made hydrophilic and negatively charged, allowing easy spreading of aqueous suspensions. 

With subsequent magnesium acetate treatment the surface is made hydrophilic and positively charged. In addition to glow discharge treatment using air, other process gases may be used to modify surface properties. For example, methanol as a process gas results in the surface becoming hydrophobic and negatively charged. Such treatment can facilitate the optional absorption of selected biomolecules.

Coating head options

A range of interchangeable, plug-in style coating head inserts are available:

Sputtering head insert. Suitable for oxidising (noble) metals. Supplied with a 57 mm Ø x 0.1 mm thick gold (Au) target as standard. For additional targets see: Ordering Information.

Additional sputter head insert. Available for quick coating material change (RS and RES versions only).

Carbon rod evaporation head insert (for 3.05 mm Ø rods).

Carbon fibre evaporation head insert.

Specimen stages

The Q150R has specimen stages to meet most requirements. All are easy-to-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage):

Rotation stage. 50 mm Ø (fitted as standard). This stage only rotates - no tilt or height adjustment.

Rotate-tilt stage. 50 mm Ø with height adjustment (target-to-stage height variable between 37 mm and 60 mm). The tilt angle can be preset.

Variable angle rotary planetary stage with 50 mm Ø specimen platform.

Large flat rotation stage for 4"/100 mm wafers.

Rotation stage for glass microscope slides.

Other options

Extended height chamber for tall specimens - for use with tall specimens and with Rotacota stage

Film Thickness Monitor (FTM). The optional 10454 consists of a controller and quartz crystal oscillator built into the Q150R, and a vacuum feed through, chamber-mounted crystal holder and quartz crystal. As sputtered or evaporated material is deposited onto the crystal its frequency of oscillation is modified. This modification is used to measure and control the thickness of metal film.



Instrument case: 585 mm W x 470 mm D x 410 mm H. The total height with coating head open is 650 mm).

Weight: 28.4 kg.

Packed dimensions: 725 mm W x 660 mm D x 680 mm H (37 kg).

Work chamber: borosilicate glass 150 mm ID x 127 mm H.

Safety shield: integral polyethylene terephthalate (PET) cylinder.

Display: Size: 145 mm, resolution: 320 mm x 240 mm colour graphic thin film transistor (TFT)

User interface:intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 10 coatings carried out and reminders for when maintenance is due.

Sputtering targets: disc-style 57 mm Ø 0.1 mm thick gold (Au) target (SC502-314A) is fitted as standard. R S and R ES versions only


Rotary pump: 5 m3/hr two-stage rotary pump with oil mist filter (order separately, see: 13034).

Vacuum measurement: Pirani gauge.

Typical ultimate vacuum: 2 x 10-2mbar in a clean system after pre-pumping with dry nitrogen gas.

Specimen stage: 60 mm Ø rotation stage.with rotation speed of 8-20 rpm. For alternative stages see Ordering Information.


Sputtering: 0-80 mA to a pre-determined thickness (with optional FTM) or by the built-in timer. The maximium sputtering time is 60 minutes (without breaking vacuum and with automatically built-in rest periods).

Carbon evaporation: A robust, ripple free DC power supply featuring pulse evaporation ensures reproducible carbon evaporation from rod or fibre sources. Current pulse: 1-70 A.

Services and other information

Gases: argon sputtering process gas, 99.999% (RS and RES versions). Nitrogen venting gas (optional).

Electrical supply: 90-250 V 50/60 Hz 1,400 VA including rotary pump power. 110/240 V voltage selectable.

Conformity: CE conformity: Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, which means reduced running costs.