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Q150V Plus - for ultra-fine coatings

The Q150V Plus is optimised for high-vacuum applications, with an ultimate vacuum of 1x10-6mbar. Together with the use of a wide-range Penning/Pirani gauge, this enables the sputtering of oxidising metals with ultra-fine grain sizes, which are suitable for high resolution imaging. The lower background pressure removes oxygen nitrogen and water vapour from the chamber, avoiding chemical reactions during the sputter process, which could otherwise lead to impurities or defects in the coatings. Similarly, lower scattering allows for high purity, amorphous carbon films of high density. 

The Q150V Plus offers all the benefits of the Q150T Plus, but with a finer grain size and thinner coating, for ultra-high-resolution applications (above x 200,000 magnification).

Key features
  • Ultimate vacuum of 1x10-6mbar
  • New multi-colour LED visual status indicator
  • 16Gb of flash memory can store more than 1000 recipes
  • New software sorts recipes per user according to recent use
  • Multiple-user profiles can be set up on one machine
  • New touch and swipe capacitive screen
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The Q150V Plus is available in three configurations:

-        Q150V S Plus   an automatic sputter coater for oxidising metals with ultra-fine grain size. Available sputtering targets          include chromium, iridium and all noble metals

-        Q150V E Plus – an automatic carbon coater (rod/cord) for TEM applications. For carbon coating TEM grids. 

-        Q150V ES Plus – a combined system capable of both sputtering and carbon coating. The deposition head inserts can be               swapped in seconds. Metal evaporation/aperture cleaning option available. 


Recommended applications for Q150V Plus

-       Ultra-high-resolution magnification SEM

-       Carbon coating of TEM grids

-       Protective platinum layers for FIB

-       R&D of corrosion-, friction-, and wear- protective layers

-       Protective layers on medical devices

-       BSE imaging

-       EDX, WDS, EBSD analysis

-       Carbon coating of replicas

-       Nano-technology e.g. Zeolites, polymer nanobrushes

These products are for Research Use Only. 


New user interface has been thoroughly updated:

•  Capacitive touch screen is more sensitive for ease of use

•  User interface software has been extensively revised, using a modern smartphone-style interface

•  Comprehensive context-sensitive help screen

•  USB interface allows easy software updates and backing up/copying of recipe files to USB stick

•  Process log files can be exported via USB port in .csv format for analysis in Excel or similar. Log files include date, time and    process parameters.

•  16GB of flash memory can store more than 1000 recipes

•  Dual-core ARM processor for a fast, responsive display

Allows multiple users to input and store coating recipes, with a new feature to sort recipes per user according to recent use.

Intelligent system logic automatically detects which insert is in place and displays the appropriate operating settings and controls for that process. 

System prompts user to confirm target material and it then automatically selects appropriate parameters for that material.

Intuitive software allows the most inexperienced or occasional operator to rapidly enter and store their own process data. For convenience a number of typical sputtering and carbon coating recipes are already stored but also allows the user to create their own.  Software detects failure to achieve vacuum in a set period of time and shuts down the process in case of vacuum leak, which ensures pump protection from overheating.


Automatic, controlled carbon rod evaporation for TEM applications

Careful evaporation allows precise control of carbon thickness (with or without the optional film thickness monitor). The quality of the resulting carbon films is also enhanced by the eradication of “sparking” that is a common feature of less advanced coaters.

For reproducible high-quality carbon films, we would recommend the use of shaped carbon rods. Rods are higher purity, less susceptible to debris and easier to control. Pulsed and ramped carbon rod recipes are supplied as standard.


Cool magnetron sputtering 

Sputter coating is a technique widely used in various applications; it is possible to create a plasma and  sputter metals with high voltage, poor vacuum and no automation. However, this is not suitable for electron microscopy applications because it will heat the sample and can result in damage when the plasma interacts  with the sample. The Q150V Plus series uses low temperature enhanced-plasma magnetrons optimised for the turbomolecular pump pressures, combined with low current and deposition control, which ensures your sample is protected and uniformly coated.

The Q150V S Plus and Q150V ES Plus use easy-change, 57 mm diameter, disc-style targets which are designed to sputter oxidising and noble metals. The Q150V S Plus and Q150V ES Plus are fitted as standard with a chromium (Cr) sputter target. Other targets options include: Au, Au/Pd, Pt/Pd, Pd, Pt, Cu, Ir, W, ITO and Al.  Others are available on request.


Pulsed cleaning for Al sputtering 

Aluminium (Al) rapidly forms an oxide layer, which can be difficult to remove, but the ES & S Plus have special recipes for aluminium that reduce the oxide removal time and prevent excessive pre-sputtering of the target.


Interchangeable plug-in heads 

This allows the user to configure the system as a sputter coater, evaporator or glow discharge system - all in one space saving format. A carbon cord evaporation insert is available as an option. Automatic detection of the head type when changed. 


Detachable chamber with built-in implosion guard 

Removable glass chamber and easily accessible base and top plate allows for an easy cleaning process.

Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples.

Tall chamber option is available for carbon evaporation to avoid sample heating, to improve uniformity for sputtering and to hold taller samples.


Multiple stage options 

The Q150V Plus has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except for the rotary planetary stage).

Some examples:

Rotation stage (supplied as standard): 50 mm Ø can accommodate six standard stubs. Height can be pre-set.
- Rotate-tilt stage for improved uniform coating: 50 mm Ø. Tilt and height can be pre-set.

- Variable angle, rotary planetary stage for heavily contoured samples.

- Large flat rotation stage with offset gear box for 4”/100 mm wafers.

- Rotation stage for glass microscope slides.

Other options are available on request. 


Safety 

The Q150V Plus meets key industry CE standards

- All electronic components are protected by covers 

- Implosion guard prevents user injury in event of chamber failure

- Vacuum interlocks remove power from deposition sources to prevent user exposure to high voltage in event of chamber being   opened

- Electrical interlocks remove power when source head cover opened

- Overheating protection shuts down power supply

Ordering Information  

27688  Q150V S Sputter Coater optimised for high-vacuum applications. High resolution turbomolecular pumped capacitive touch-screen controled sputter coater with status LED indicator, including 10034 quick release sputter insert and one TK8845 57mm diameter x 0.3mm chromium target. 10067 rotating specimen stage, 50mm diameter, supplied as standard.

27685  Q150V E Carbon Evaporator optimised for high-vacuum applications. Turbomolecular pumped capacitive touch-screen controled carborn evaporator with status LED indicator suitable for TEM and SEM applications. Fitted with a carbon rod evaporation head for 3.05mm diameter carbon rods. Supplied with carbon rods (C5422 3.05mm x 300mm) and a carbon rod shaper (manual operation). 10067 rotating specimen stage, 50mm diameter, supplied as standard.

27621  Q150V ES Combined Sputtering and Carbon Coating System optimised for high-vacuum applications
The deposition heads can be swapped in seconds and the intelligent system logic automatically recognises which head is in place and displays the appropriate operating settings. Consists of high resolution turbomolecular pumped capacitive touch-screen controled sputter coater and carborn evaporator with status LED indicator, including quick release sputter insert and one TK8845 57mm diameter x 0.3mm chromium target, and high vacuum carbon rod evaporation coater, including quick-release carbon rod insert for 3.05mm diameter carbon rods. Coating inserts are interchangeable. 10067 rotating specimen stage, 50mm diameter, supplied as standard. 

Rotary pump requirements

13034   5m3hr-1  2 Stage Oil Sealed Rotary Vane Pump

Dry pumping options:

11540. Diaphragm pump. Vacuubrand MD1 23 L/m

For further information see: Rotary Pumps and Dry Pumps for details.


Options and accessories

Head inserts and glow discharge

10453. Additional sputter insert for quick metal change (V E and V ES version only). NB: this is an entire sputtering assembly - individual targets can also be purchased

10455. Carbon fibre insert. Supplied with 2 m C5421 carbon fibre cord. For additional carbon see: Carbon Supplies (below).

10456.  Carbon Rod Evaporation Insert. For 6.15mm diameter carbon rods.

10457. Metal evaporation and aperture insert. Including the ability to evaporate upwards or downwards (V E and V ES version only). Supplied with a pack of 10 tungsten filaments (B5230) and a molybdenum (Mo) boat.

10262.  Glow discharge insert 


Specimen stages 

10067  50 mm Stage

10357  Tilt Stage Assembly. 50mm diameter specimen stage with adjustable tilt up to 90 degrees.

10358  Slide Stage. For glass microscope slides (up to 2 x 75mm x 25mm slides).

10360  "Rotacota" Type Stage. Variable tilt angle, planetary stage, rotational speed 8-20 rpm.

10458  4" Wafer Stage and Gearbox Flat rotation specimen stage for 4" wafers.

10787  4" Wafer stage. A flat 4"/102 mm flat, drop-in wafer stage which accepts 2", 3" or 4" wafers

23850  Tilt Stage Assembly 4"

10788  4" Stub Holder

10808  8 Place Stub Stage for 30mm and 32mm ø stubs

11856  14 Place Stub Stage for 25mm and 30mm ø stubs

12043  9 Place Coverslip Stage 92 mm ø stage accepts nine 20 x 20mm cover slips

12305  4 Place 25mm ø Stub Stage


Other options and accessories

10454  Film Thickness Monitor (FTM) Attachment. Including oscillator, feed-through, quartz crystals and holder.  Please note, when evaporating carbon, the FTM ideally should only be used to provide a general indication of the coating thickness. It is not recommended that the FTM is used for termination of the coating process.

C5460  Film Thickness Monitor (FTM) Crystal (spare)

11540  Diaphragm Pump MD1 23 L/M

O7803  Basic Oil Mist Filter (spare)

13233  1L  Rotary Pump Oil (spare)

13235  5L  Rotary Pump Oil (spare)

27508  O-ring (each) 2 required per coater

27607  Non-seal L Gasket 

27728  Q150V ES Two Year Spares Kit. Includes TK8845 chromium target, standard glass cylinder assembly (27608), C5421 carbon fibre cord, C5461 carbon fibre - fine, C5422 carbon rods 3.05mm, C5460 quartz crystals, O-rings, springs. 

27729  Q150V E Two Year Spares Kit. Includes Q150V standard glass cylinder assembly (027608), C5421 carbon fibre cord, C5461 carbon fibre - fine, C5422 carbon rods 3.05mm, C5460 quartz crystals, O-rings, springs.

27730  Q150V S Two Year Spares Kit Includes TK8845 chromium target, standard glass cylinder assembly (27608), C5460 quartz crystals, O-rings. 

Sputter Targets 

SC502-314A. Gold (Au).

SC502-314A/0.2mm. Gold (Au) 0.2 mm.

TK8889. Gold (Au) 0.3 mm.

SC502-314B. Gold/palladium (Au/Pd - 80:20).

SC502-314B/0.2mm. Gold/palladium (Au/Pd - 80:20%) 0.2 mm.

TK8891. Gold/palladium (Au/Pd - 80:20) 0.2 mm.

SC502-314C. Platinum (Pt).

SC502-314C/0.2mm. Platinum (Pt) 0.2 mm. 

TK8893. Platinum (Pt) 0.3 mm. 

SC502-314D. Nickel (Ni).

SC502-314E. Silver (Ag).

SC502-314G. Palladium (Pd).

SC502-314H. Copper (Cu).

TK8878. Platinum/Palladium (Pt/Pd - 80:20).

TK8887. Platinum/Palladium (Pt/Pd - 80:20) 0.3 mm.

TK8845. Chromium (Cr) 0.3 mm.

TK8862. Chromium (Cr)1.5 mm. 

TK8867. Tungsten (W) 0.2 mm.

TK8846. Tungsten (W) 0.5 mm.

TK8869. Carbon (C) 1.5 mm.

TK8875. Aluminium (Al) 1 mm.

TK8895. Titanium (Ti) 0.5 mm.

TK8879. Titanium (Ti) 1.5 mm.

TK8897. Iron (Fe).

TK8899. Iridium (Ir) 0.3 mm.

TK8900. Cobolt (Co) 0.3 mm.

TK8902. Tin (Si).

TK8903. Molybdenum.

TK8905. Magnesium (Mg) 0.3 mm thick.

TK8906. Tantalum (Ta).

TK8907. Indium tin oxide (ITO)

Carbon supplies

A0830A. Carbon rods - 6.15 mm Ø x 100 mm length (unshaped) - pack of 10.

C5422. Carbon rods 3.05 Ø x 100 mm, (unshaped) - pack of 10.

C5421. Carbon fibre cord - 1 m.

C5421-10. Carbon fibre cord - 10 m.

C5421-100. Carbon fibre cord - 100 m.

C5461  Carbon fibre - fine strands (1m)

C5461-10  Carbon fibre - fine strands (10m)

C5461-100 Carbon fibre - fine strands (100m)

13232. Manual carbon rod shaper for 3.05 mm Ø carbon rods.

12097  Wedge tool 

Other consumables and spare parts

27608  Additional Standard Glass Cylinder Assembly. Includes glass chamber, implosion guard and gaskets. 

13530  Standard Coating Shield Assembly   

27691  Extended Glass Cylinder Assembly.  220mm high (standard chamber is 133mm high). For increased source to sample distance and coating large samples.

11880  Extended Height Coating Shield Assembly 

B5230. Tungsten filament basket - pack of 10 (for use with 10457 metal evaporation insert).

B5228. Molybdenum boats - pack of 10.




Instrument case

585 mm W x 470 mm D x 410 mm H

(total height with coating head open: 650 mm)

Weight

33.4 kg (packed: 42 kg)

Packed dimensions

725 mm W x 660 mm D x 680 mm H

Work chamber

Borosilicate glass 150 mm ID x 133 mm H

Display

115.5mm W x 86.4mm H (active area), 640 RGB x 480 (display format), capacitive touch colour display

User interface

Full graphical interface with touch screen buttons, includes features such as a log of the last 1000 coatings and reminders for when maintenance is due.


Sputter target

Disc-style 57 mm Ø. A 0.3 mm thick chromium (Cr) is fitted as standard. V S and V ES versions only

Specimen stage

50 mm Ø rotation stage with rotation speed of 8-20 rpm. Other stages available on request.

Vacuum

Rotary pump:  5 m3/hr two-stage rotary pump with oil mist filter. Hydraulically-formed bellows stainless-steel backing line.

Turbo pump:  Internally mounted 70 L/s air-cooled

Vacuum Measurement: Wide range gauge (10428)

Ultimate vacuum: 1 x 10-6 mbar*

Pump down time: 5x10-6 mbar in 30 mins* 

Sputter vacuum range: Between 5 x 10-3 and 1 x 10-1mbar for gold targets

*Typical ultimate vacuum of the pumping system in a clean instrument after pre-pumping and venting with dry nitrogen gas


Processes

Sputtering: Sputter current 0-150 mA to a predetermined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without breaking vacuum and with automatically built-in cooling periods)

Evaporation: Carbon evaporation using rods/cord. Thermal evaporation of metals from filaments or boats. For cleaning TEM apertures a standard molybdenum boat (supplied) can be fitted


Visual status indicator

A large multi-colour status indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance.

The indicator LED shows the following states:

•  Initialisation

•  Process running

•  Idle

•  Coating in progress

•  Process completed

•  Process ended in fault condition

Audio indication also sounds on completion of the process.