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Q300T T Triple Target, Large Chamber, Turbo-Pumped Sputter Coater

The Q300T T is a large chamber, turbo-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8"/200 mm (e.g. a wafer), or multiple smaller specimens over a similar diameter. The Q300T T is suitable for sputtering both noble and oxidising metals.
Key features
  • Large area, turbo pumped sputter coating - up to 8"/200 mm diameter
  • Triple sputtering head - ensures even coating deposition of large specimens
  • Single target selection - for economic coating of small specimens
  • Fine grain sputtering - for advanced high resolution FE-SEM applications
  • High-vacuum turbo pumping - allows sputtering of a wide range of oxidising and non-oxidising (noble) metals - suitable for SEM, high resolution FE-SEM and also for many thin film applications
  • Precise thickness control using the film thickness monitor option
  • Fully automatic touch screen control - rapid data input, simple operation
  • Easy-to-change, drop-in style specimen stages (rotation stage as standard)
  • Thick film coating - up to 60 minutes sputtering time without breaking vacuum
  • Extended warranty option
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Ideal for sputter coating large specimens, thin film applications and SEM/FE-SEM

The Q300T T is designed to sputter a range of oxidising and non-oxidising (noble) metals for scanning electron microscopy (SEM) and thin film applications. An extensive range of sputtering target materials is available - see Ordering Information.

High-vacuum turbomolecular pumping

The Q300T T is fitted with an internally mounted 70 L/s turbomolecular pump, backed by a 5 m3hr two-stage rotary pump (order separately). A Pirani vacuum measurement gauge is included and a full range gauge  is available as an option. Ultimate vacuum levels of around 5 x 10-5 mbar can be expected in a clean system after pre-pumping with dry nitrogen gas.


Triple sputtering head - for even deposition

The Q300T T is fitted with three individual sputtering heads to ensure even deposition of individual large specimens or multiple specimens. For economical coating of small specimens, ‘single target’ mode can be selected.

Note that it is not possible to sequentially sputter three different sputtering metals from each sputtering head - for sequential coating see the Q300T D Dual Target Sequential Sputtering System.


Automatic touch-screen control, rapid data entry

The Q300T T is presented in a custom-moulded, one-piece case, with easy servicing access. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.  

At the operational heart of the Q300T T is a colour touch screen, which allows even the most inexperienced or occasional operator to rapidly enter and store their own process data. A number of typical sputter coating profiles are already stored and, for convenience, summaries of the last 100 coatings carried out can be viewed.


Safe operation, clean vacuum and rotary specimen stage as standard

The vacuum chamber has an internal diameter of 283 mm/12” and comes with an integral implosion guard. The vacuum shutdown option can enhance vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.

 A variable speed rotary specimen stage is fitted as standard and accommodates 200 mm/8” and 150 mm/6” wafers, with other stages available as options. For further details see: Ordering Information.


Maintenance 

The touch screen interface features maintenance prompts which highlight the time of last clean, coating time since last cleaned, system ‘on time’ and time of last service.


Pumping requirement

A suitable rotary vacuum pump is required. The Pfeiffer DUO 6  5 m3/hr two-stage rotary vacuum pump is ideal for this purpose. Dry pumping alternatives are also available. See: Ordering Information for more details.

10824. Q300T T Triple Target, Large Chamber, Turbo-Pumped Sputter Coater

Fitted with three sputtering heads to ensure even metal deposition. Includes three 57 mm Ø x 0.3 mm chromium (Cr) sputter targets (TK8845). A 10826 flat rotation stage for 200 mm/8" and 150 mm/6" wafers is fitted as standard.


Rotary pump requirements

13034. Rotary pump. 5 m3/hr Pfeiffer Duo 6 two-stage rotary vacuum pump. Includes vacuum hose, coupling kit and oil mist filter.

Dry pumping options:

26907. Edwards dry scroll pump nXDS10i. Pumping speed: 11.4 m/3hr.

11540. VacuuBrand MD1 diaphragm pump.


Options and accessories

Specimen stages

10357. Rotating 50 mm Ø specimen stage with adjustable tilt.

The platform has six specimen stub positions for 15 mm, 10 mm, 6.5 mm or 1/8" pin stubs. Stage rotation speed is variable between preset limits. No rotation when in 'single target' mode.

Target-to-stage height is variable between 0-42 mm for the standard stage. When used with the extended height cylinder (optional accessory 10596) the target to stage height is an additional 87 mm.

10067. 50 mm Ø variable height specimen stage with six stub positions for 15 mm, 10 mm, 6.5 mm disc stubs.

10360. 50 mm Ø "Rotacota" stage. A rotary planetary-style stage with variable tilt angle from horizontal to 30º. The platform has six positions for either 15 mm, 10 mm, 6.5 mm disc stubs or 1/8" pin stubs. Rotation speed is variable between preset limits. Depending on specimen height, this stage may require the optional extended height cylinder.

10358. 90 mm Ø specimen stage for glass microscope slides. Designed to hold two x 75 mm x 25 mm slides or a single 75 mm x 50 mm slide. The stage can alternatively accommodate up to six 1/8" SEM pin stubs. The stage rotation speed is variable between preset limits and includes a gear box to allow the optional FTM to be used.


Other options

11520. Film thickness monitor (FTM). Including oscillator, feed-through, quartz crystal holder and one C5460 quartz crystal.

C5460. Spare quartz crystal.

10596. Extended height vacuum chamber 214 mm H (the standard chamber is 127 mm H). Recommended for increased source-to-specimen distance and for coating large specimens.

10422. Rotating vacuum spigot. Allows a more convenient connection of the vacuum pump hose to the rear of the Q300T T when bench depth is limited.

11223. A lockable emergency stop (e-stop) switch. This can be mounted on top of the system in a position easily accessible for the operator and has a key to release the knob after activation. The addition of the e-stop does not inhibit or replace the normal on/off switch function.

11577. Coating shields. To protect large surfaces from coating deposition - removable for ease of cleaning.

10428. Full range, active vacuum gauge. Capable of measurement over the range of 1,000 mbar to 5 x 10-9mbar. Typical ultimate vacuum of system is in the region of 5 x 10-5mbar. Must be factory fitted.

11289. Spares kit. Including: spare standard glass cylinder, three 57 mm Ø x 0.3 mm chromium (Cr) targets (TK8845), vacuum tubing with coupling insert, argon gas tubing, three sputter head magnets, rotary pump oil mist filter and fuses.


Sputter targets

The Q300T T is fitted as standard with three 57 mm Ø x 0.3 mm chromium (Cr) targets (TK8845). 

Other optional targets are available (three required) 0.1 mm thick unless otherwise stated.

SC502-314A. Gold (Au) 

SC502-314A/0.2 mm. Gold (Au) 0.2 mm 

SC502-314B. Gold/palladium (Au/Pd - 80:20)

SC502-314B/0.2 mm. Gold/palladium (Au/Pd - 80:20) 0.2 mm

SC502-314C. Platinum (Pt)

SC502-314C/0.2 mm. Platinum (Pt) 0.2 mm

SC502-314D. Nickel (Ni)

SC502-314E. Silver (Ag)

SC502-314G. Palladium (Pd) 

SC502-314H. Copper (Cu)

TK8875. Aluminium (Al)

TK8869. Carbon (C) 1.5 mm

TK8845. Chromium (Cr) 0.3 mm 

TK8862. Chromium (Cr) 1.5 mm 

TK8900. Cobalt (Co)

TK8889. Gold (Au) 0.3 mm

TK8891. Gold/palladium (Au/Pd - 80:20) 0.3 mm

TK8907. Indium tin oxide (ITO) 3 mm

TK8899. Iridium (Ir) 0.3 mm

TK8897. Iron (Fe)

TK8905. Magnesium (Mg) 0.5 mm 

TK8903. Molybdenum (Mo)

TK8893 Platinum (Pt) 0.3 mm

TK8887. Platinum/palladium (Pt/Pd - 80:20) 0.3 mm

TK8906. Tantalum (Ta)

TK8902. Tin (Sn) 

TK8879. Titanium (Ti) 1.5 mm 

TK8895. Titanium (Ti) 0.5 mm 

TK8846. Tungsten (W) 0.5 mm 

TK8867. Tungsten (W) 0.2 mm

Options and Accessories (including details of the standard specimen stage) 

Specimen stages

The Q300T T has specimen stages to meet most requirements. All are easy-change, drop-in style (no screws) and are height adjustable (except rotary planetary stage). The rotation speed is variable between preset limits.

Flat rotation stage for wafers. For 200 mm/8" and 150 mm/6" wafers (fitted as standard).

Rotation stage -50 mm Ø. This stage has height adjustment.

Rotate-tilt stage - 50 mm Ø. With height adjustment (target-to-stage height variable between 30-80 mm). The tilt angle can be preset from horizontal to 30º.

Rotation stage for glass microscope slides.


Other options

Extended height chamber for taller specimens

Film thickness monitor (FTM). The optional FTM attachment (11520) consists of a controller and quartz crystal oscillator built into the Q300T T and a vacuum feed-through, chamber-mounted crystal holder and quartz crystal.  The FTM cannot be used when the coater is operated in 'single target' mode. 


Specification

Instrument case. 585 mm W x 470 mm D x 410 mm H (total height with coating head open: 650 mm).

Weight. 36.4 kg.

Packed dimensions. 725 mm W x 660 mm D x 680 mm H (44.8 kg).

Work chamber. borosilicate glass, 283 mm ID x 127 mm H.

Safety shield. Integral polyethylene terephthalate (PET) cylinder.

Display: Size: 145 mm, resolution: 320 mm x 240 mm colour graphic thin film transistor (TFT)

User interface. Intuitive full graphical interface with touch screen buttons, includes features such as a log of the last 100 coatings carried out and reminders for when maintenance is due.

Sputter targets. Disc style 57 mm Ø with thickness depending upon the targets fitted. Three 57mm Ø x 0.3 mm thick chromium (Cr) targets (TK8845) are fitted as standard.

Vacuum. High vacuum pumping by an internally-mounted, 70L/s air-cooled turbomolecular pump.

Rotary pump. 5m3hr Pfeiffer DUO 6 two-stage rotary pump with oil mist filter. (Order separately: 13034).

Vacuum measurement. Built-in Pirani gauge. Typical ultimate vacuum: 5 x 10-5mbar in a clean system after pre-pumping with dry nitrogen gas.

Specimen stage. Flat rotation stage for 200 mm/8" and 150 mm/6" wafers fitted as standard. Rotation speed is variable between preset limits. For alternative stages see Ordering Information.

Processes

Sputtering. 0-80 mA to a predetermined thickness (with optional FTM) or by the built-in timer. The maximum sputtering time is 60 minutes (without 'breaking' vacuum and with built-in rest periods).

Services and other information

Gases. Argon sputtering process gas, 99.999%. Nitrogen venting gas (optional).

Electrical supply. 90-250 V 50/60 Hz 1,400 VA including 13034 rotary pump.

Conformity

Power factor correction. Complies with the current legislation (CE Certification) and ensures efficient use of power, resulting in reduced running costs.